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Content archived on 2024-05-29

Nanoimprint lithography for novel 2- and 3- dimensional nanostructures

Objective

The main problem in nanotechnology is the lack of methods for mass production. This is especially true for SMEs, which do not have the ability to invest in expensive equipment for large-scale production of nanostructures. Nano-imprint lithography on the other hand provides a tool that is comparably cheap and suited for mass production.

3D NANOPRINT aims at the development of a complete process technology with the necessary tools to produce 3-dimensional nanostructures with ultra high precision. In comparison to deep or extreme ultra violet lithography (abbreviated as DUV and EUV lithography respectively) this research paves the way for the widespread use of a nanoscale production technology also by smaller companies, since the investment costs of nanoimprint production lines are less than 1% of the DUV or EUV investments.

Call for proposal

FP6-2002-SME-1
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Funding Scheme

Data not available

Coordinator

PROFACTOR GMBH
EU contribution
No data
Address
IM STADTGUT A2
STEYR-GLEINK
Austria

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Total cost
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Participants (8)