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Nanoimprint lithography for novel 2- and 3- dimensional nanostructures

Objective

The main problem in nanotechnology is the lack of methods for mass production. This is especially true for SMEs, which do not have the ability to invest in expensive equipment for large-scale production of nanostructures. Nano-imprint lithography on the other hand provides a tool that is comparably cheap and suited for mass production.

3D NANOPRINT aims at the development of a complete process technology with the necessary tools to produce 3-dimensional nanostructures with ultra high precision. In comparison to deep or extreme ultra violet lithography (abbreviated as DUV and EUV lithography respectively) this research paves the way for the widespread use of a nanoscale production technology also by smaller companies, since the investment costs of nanoimprint production lines are less than 1% of the DUV or EUV investments.

Call for proposal

FP6-2002-SME-1
See other projects for this call

Coordinator

PROFACTOR GMBH
Address
Im Stadtgut A2
Steyr-gleink
Austria

Participants (8)

BROWN & SHARPE PRECIZIKA
Lithuania
Address
Zirmunu St. 139
Vilnius
EV GROUP E. THALLNER GMBH
Austria
Address
Di Erich Thallner Strasse 1
Schärding
FRIEDRICH-SCHILLER-UNIVERSITAET JENA
Germany
Address
Fuerstengraben 1
Jena
HEPTAGON OY
Finland
Address
Tekniikantie 12
Espoo
INSTITUTE OF PHYSICAL ELECTRONICS OF KAUNAS UNIVESITY OF TECHNOLOGY
Lithuania
Address
Savanoriu, 271
Kaunas
JOHANNES KEPLER UNIVERSITAET LINZ
Austria
Address
Altenbergerstrasse 69
Linz
MICRO RESIST TECHNOLOGY GESELLSCHAFT FUER CHEMISCHE MATERIALIEN SPEZIELLER PHOTORESISTSYSTEME MBH
Germany
Address
Koepenicker Strasse 325, Haus 211
12555 Berlin
SENTECH INSTRUMENTS GMBH
Germany
Address
Carl-scheele Strasse 16
Berlin