Periodic Reporting for period 1 - HISTORIC (High efficiency GaInP/GaAs Tandem wafer bonded solar cell on silicon)
Reporting period: 2015-06-01 to 2017-05-31
In the practice, however, there are still hurdles to be overcome. Combining III-V semiconductor materials with silicon is highly challenging. III-V materials have some fundamental crystallographic differences with silicon (lattice and thermal mismatch, polarity difference), and thus it is challenging to grow III-V layers with sufficient electrical quality directly on silicon. The innovative approach proposed in this project bypasses this issue and enables to have high quality III-V crystals combined with silicon, using a microelectronic technique called surface activated wafer bonding. With this approach, the III-V solar cells and the wafer based silicon solar cell are prepared separately, and combined using the surface activated wafer bonding technique. Once permanently joined, the III-V substrate is removed, resulting in 3-5 μm thin III-V solar cells on top of the silicon wafer (See fig. 2). The objective of this research project was to use the surface activated wafer bonding technique to produce such hybrid III-V/silicon triple-junction solar cells (GaInP/GaAs//Si), and achieve large area (4 cm2) devices with an efficiency exceeding 30% in 2-terminal configuration (under 1-sun AM1.5G conditions). These solar cells may serve as a drop in replacement into standard flat plate photovoltaic modules which facilitates market introduction.
- i) An optical model for the triple-junction GaInP/GaAs//Si solar cell, including about 30 layers, has been developed (anti-reflection coatings, p-n junctions, tunnel junctions, etc.) using the transfer matrix method. This optical model was crucial to identify experimental losses and design III-V top cells suitable for current matching with silicon.
- ii) A processing route compatible with both III-V and silicon material specifications has been established. Among the decisive steps for high processing quality, we can list: - A minimum number of handling steps while meeting the requirements of high performance silicon cell manufacturing (ion implantation) - The implementation of a stable (AlOx/SiNx) silicon back side passivation after bonding - Suitable front grid design ensuring minimum area metal coverage and resistance loss.
- iii) Investigations of GaAs/Si bond interface revealed: - The link between surface particle contamination (optical scan) and voids after bonding (acoustic scans) - The importance of limiting the sample handling steps and working in a controlled environment to minimize surface particle contamination. Excellent bond yield (4 inch, quasi void-free) has been achieved with bond resistance below 5 mΩ.cm2
- iv) Based on the above-listed findings, wafer bonded GaInP/GaAs//Si triple-junction cells were processed and their performances assessed (EQE, IV-characteristics, reflection and electroluminescence). As a result of iterative improvement with simulation and experience, a 2-terminal record 4cm2 solar cell with 1-sun power conversion efficiency of 30.2% was measured and certified in Fraunhofer ISE Calibration Laboratory (see fig. 3). Toward the end of the project, pursuing the same approach, the device efficiency was pushed even further: a certified value of 31.3% was achieved.
Those results were shared with the scientific community in oral presentations and posters during international conferences, in peer reviewed scientific articles (e.g. DOI: 10.1109/JPHOTOV.2016.2629840) as well as to the general public with press releases and special highlight article in PHOTON International – The Solar Power Magazine. Further details can be found on the project webpage (www.ise.fraunhofer.de/en/research-projects/historic) which summarizes the objectives and main results.