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Plasmonically-enhanced III-V nanowire lasers on silicon for integrated communications

Project information

PLASMIC

Grant agreement ID: 678567

Status

Ongoing project

Start date

1 April 2016
End date

31 March 2021

Funded under:

H2020-EU.1.1.

Overall budget:

€ 1 941 750
EU contribution

€ 1 941 750

Hosted by:

IBM RESEARCH GMBH

Switzerland

Objective

The ambition of PLASMIC is to address the bottleneck caused by electrical interconnects and develop on-chip optical interconnect solutions based on plasmonically-enhanced nanoscale emitters.
Nanoscale photonic components are desirable for on-chip communications because of density, speed and because reducing the size of the cavity might reduce the lasing threshold. Conventional photonics are limited in scale by the diffraction-limit to dimensions of half of the wavelength of light in the material. This limit does not apply to plasmonics, an optical mode that exists at the interface between a metal and a dielectric. Thus, they have a great potential for applications where down-scaling and confinement are primordial.
One of the barriers for applying plasmonics is the large losses associated with the metals. Thus in PLASMIC alternative plasmonic metals will be investigated based on their potential for tuning, VLSI compatibility, deposition methods and achieving lower optical losses in the near-IR. I will focus on highly doped semiconductors, metal nitrides, as well as multi-layers and compounds to form new plasmonic materials. Specifically, I will evaluate the use of the field-effect to achieve the semiconductor-metal transition to tune the plasma frequency.
New pioneering device concepts for plasmonic-photonic emitters on a silicon platform integrated with passive silicon photonic waveguides will be developed. To implement the gain medium for the lasers, I will exploit a novel nanowire (NW) integration approach: Template-Assisted Epitaxy. The unique advantages make it possible to grow III-V NWs on any orientation of silicon and aligned to lithographic features.
The devices will be based on a hybrid cavity formed between the NW and a Si waveguide with gratings to provide feedback. My team and I will explore dimensional scaling potential as well as the energy efficiency of plasmonic and photonic devices operating both in a lasing as well as in a subthreshold operation mode.

Field of Science

/natural sciences/chemical sciences/inorganic chemistry/inorganic compounds

Programme(s)

H2020-EU.1.1. - EXCELLENT SCIENCE - European Research Council (ERC)

Topic(s)

ERC-StG-2015 - ERC Starting Grant

Call for proposal

ERC-2015-STG

See other projects for this call

Funding Scheme

ERC-STG - Starting Grant

Host institution

IBM RESEARCH GMBH

Address

Saeumerstrasse 4
8803 Rueschlikon

Switzerland

Activity type

Private for-profit entities (excluding Higher or Secondary Education Establishments)

EU Contribution

€ 1 941 750

Website

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Beneficiaries (1)

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IBM RESEARCH GMBH

Switzerland

EU Contribution

€ 1 941 750

Project information

PLASMIC

Grant agreement ID: 678567

Status

Ongoing project

Start date

1 April 2016
End date

31 March 2021

Funded under:

H2020-EU.1.1.

Overall budget:

€ 1 941 750
EU contribution

€ 1 941 750

Hosted by:

IBM RESEARCH GMBH

Switzerland

Project information

PLASMIC

Grant agreement ID: 678567

Status

Ongoing project

Start date

1 April 2016
End date

31 March 2021

Funded under:

H2020-EU.1.1.

Overall budget:

€ 1 941 750
EU contribution

€ 1 941 750

Hosted by:

IBM RESEARCH GMBH

Switzerland

Project information

PLASMIC

Grant agreement ID: 678567

Status

Ongoing project

Start date

1 April 2016
End date

31 March 2021

Funded under:

H2020-EU.1.1.

Overall budget:

€ 1 941 750
EU contribution

€ 1 941 750

Hosted by:

IBM RESEARCH GMBH

Project information

PLASMIC

Grant agreement ID: 678567

Status

Ongoing project

Start date

1 April 2016
End date

31 March 2021

Funded under:

H2020-EU.1.1.

Overall budget:

€ 1 941 750
EU contribution

€ 1 941 750

Hosted by:

IBM RESEARCH GMBH

Switzerland

Deliverables

Deliverables not available

Publications

Peer reviewed articles (4)

Concurrent Zinc-Blende and Wurtzite Film Formation by Selection of Confined Growth Planes

Author(s): Philipp Staudinger, Svenja Mauthe, Kirsten E. Moselund, Heinz Schmid

Published in: Nano Letters, Issue 18/12, 2018, Page(s) 7856-7862, ISSN 1530-6984

DOI: 10.1021/acs.nanolett.8b03632

Microcavity Lasers on Silicon by Template-Assisted Selective Epitaxy of Microsubstrates

Author(s): Benedikt F. Mayer, Stephan Wirths, Svenja Mauthe, Philipp Staudinger, Marilyne Sousa, Joel Winiger, Heinz Schmid, Kirsten E. Moselund

Published in: IEEE Photonics Technology Letters, 2019, Page(s) 1-1, ISSN 1041-1135

DOI: 10.1109/lpt.2019.2916459

Room-Temperature Lasing from Monolithically Integrated GaAs Microdisks on Silicon

Author(s): Stephan Wirths, Benedikt F. Mayer, Heinz Schmid, Marilyne Sousa, Johannes Gooth, Heike Riel, Kirsten E. Moselund

Published in: ACS Nano, Issue 12/3, 2018, Page(s) 2169-2175, ISSN 1936-0851

DOI: 10.1021/acsnano.7b07911

InP-on-Si Optically Pumped Microdisk Lasers via Monolithic Growth and Wafer Bonding

Author(s): Svenja Mauthe, Noelia Vico Trivino, Yannick Baumgartner, Marilyne Sousa, Daniele Caimi, Thilo Stoeferle, Heinz Schmid, Kirsten Moselund

Published in: IEEE Journal of Selected Topics in Quantum Electronics, 2019, Page(s) 1-1, ISSN 1077-260X

DOI: 10.1109/jstqe.2019.2915924

Conference proceedings (4)

Monolithic integration of III-Vs on silicon for electronic and photonic applications (Invited)- as an invited talk it was not peer reviewed, not available online yet

Author(s): S. Mauthe, H. Schmid, B. Mayer, S. Wirths, P. Staudinger, Y. Baumgartner, C. Convertino, L. Czornomaz, M. Sousa and K. E. Moselund

Published in: 44th Micro- and Nanoengineering conference, MNE, Issue yearly, 2018

Monolithic integration of III-V on Si applied to lasing micro-cavities: insights from STEM and EDX

Author(s): M. Sousa, S. Mauthe, B. Mayer, Wirths, H. Schmid, K.E. Moselund

Published in: IEEE Nano, Track 3. Nanoelectronics: New Materials II, Issue yearly, 2018

DOI: 10.1109/nano.2018.8626223

Modeling whispering gallery mode III-V micro-lasers monolithically integrated on Silicon - not presented yet

Author(s): S. Sant and A. Schenk, B. Mayer, S. Wirths, S. Mauthe, H. Schmid, and K. E. Moselund

Published in: Numerical Simulation of Optoelectronic Devices (NUSOD), Issue annually, 2018

Monolithic Integration of III-V on silicon for photonic and electronic applications (Invited) - invited, hence not peer reviewed

Author(s): S. Mauthe, H. Schmid, B. Mayer, S. Wirths, C. Convertino, Y. Baumgartner, L. Czornomaz, M. Sousa, P. Staudinger, H. Riel and K. E. Moselund

Published in: Device Research Conference, Issue annually, 2018

Other (1)

Wurtzite InP Microdisks: from Epitaxy to Room-Temperature Lasing

Author(s): Philipp Staudinger, Svenja Mauthe, Noelia Vico Triviño, Steffen Reidt, Kirsten E. Moselund, Heinz Schmid

Published in: arXiv:2004.10677 [physics.app-ph], 2020

Project information

PLASMIC

Grant agreement ID: 678567

Status

Ongoing project

Start date

1 April 2016
End date

31 March 2021

Funded under:

H2020-EU.1.1.

Overall budget:

€ 1 941 750
EU contribution

€ 1 941 750

Hosted by:

IBM RESEARCH GMBH

Project information

PLASMIC

Grant agreement ID: 678567

Status

Ongoing project

Start date

1 April 2016
End date

31 March 2021

Funded under:

H2020-EU.1.1.

Overall budget:

€ 1 941 750
EU contribution

€ 1 941 750

Hosted by:

IBM RESEARCH GMBH

Switzerland

Project information

PLASMIC

Grant agreement ID: 678567

Status

Ongoing project

Start date

1 April 2016
End date

31 March 2021

Funded under:

H2020-EU.1.1.

Overall budget:

€ 1 941 750
EU contribution

€ 1 941 750

Hosted by:

IBM RESEARCH GMBH

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Last update: 7 March 2016

Record number: 200720

Permalink: https://cordis.europa.eu/project/id/678567/results

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