Objective The objectives of BOLD are to build and test two lithographic systems that will enable the evaluation of high numerical aperture (NA) optics and scan-and-repeat technology with a resolution in the sub-0.3 micron range. A prototype wafer stage optical lithography system with high accuracy and high speed based on novel principles has been realized. A new motor concept has been introduced and is being evaluated, as are new alignment and interferometry systems. The basic design and technology for the step and scan lens have been established, and the effects of a finite laser bandwidth on the lens performance have been calculated. Market requirements for 0.25 micron scanning systems have been considered, and based on this a system outline for a production step and scan system has been drawn up. Simulation is being used to study the effects of the source and illumination characteristics on the overall performance. User inputs are continuously refined and updated, and are considered in the overall planning.Projection systems with very high NA at short wavelengths will be designed and a prototype lens system built. The possibilities of scan-and-repeat and other photocomposition methods will be investigated, with the emphasis placed on accommodating large chip sizes for future ASIC devices. The most critical subsystems (high-precision synchronised wafer and reticle stages) will be built and tested in a laboratory system. System requirements will be provided by a user group, and the resolution and overlay of the new techniques evaluated. Fields of science natural sciencesphysical sciencesopticslaser physics Programme(s) FP3-ESPRIT 3 - Specific research and technological development programme (EEC) in the field of information technologies, 1990-1994 Topic(s) Data not available Call for proposal Data not available Funding Scheme Data not available Coordinator ASM LITHOGRAPHY EU contribution No data Address MEIERIJWEG 15, 8805 5503 HN VELDHOVEN Netherlands See on map Total cost No data Participants (6) Sort alphabetically Sort by EU Contribution Expand all Collapse all CARL ZEISS GMBH Germany EU contribution No data Address CARL-ZEISS-STRAßE 4-54 73447 OBERKOCHEN See on map Total cost No data Centre National d'Études des Télécommunications (CNET) France EU contribution No data Address 38-40 rue du Général Leclerc 92131 Issy-les-Moulineaux See on map Total cost No data Commissariat à l'Energie Atomique (CEA) France EU contribution No data Address Centre d'Études de Grenoble 17 avenue des Martyrs 38041 Grenoble See on map Total cost No data Fraunhofer-Gesellschaft zur Förderungder Angewandten Forschung e.V. Germany EU contribution No data Address Dillenburgerstrasse 14199 Berlin See on map Total cost No data IBM Deutschland GmbH Germany EU contribution No data Address Pascalstraße 100 70569 Stuttgart See on map Total cost No data INTERUNIVERSITAIR MIKROELEKTRONICA CENTRUM Belgium EU contribution No data Address KAPELDREEF, 75 3030 HEVERLEE See on map Total cost No data