Objectif
In this project, the possibility of producing electrical grades of sheet with silicon levels as high as 6.5% by chemical deposition of silicon on conventional sheet and subsequent thermal diffusion treatments which could overcome the inherent cold brittleness of SiFe will be studied. The silicon deposition and diffusion mechanisms will be modelled and a realistic process production route will be defined.
Thème(s)
Appel à propositions
Data not availableRégime de financement
CSC - Cost-sharing contractsCoordinateur
00128 ROMA EUR
Italie