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Metrology Advances for Digitized ECS industry 4.0

Project description

Novel metrology technologies to revolutionise the European semiconductor industry

Metrology is the eyes and ears of many industries including the semiconductor. For any electronic measurement system, there is a trade-off between the sensitivity, precision and accuracy. The EU-funded MADEin4 project will develop novel solutions Industry 4.0 solutions for the European semiconductor manufacturing industry to overcome this barrier. Connecting nearly 50 European manufacturers and research and technology organisations, the project is working on advanced and highly connected cyber physical systems using a novel Industry 4.0 approach that combines metrology data analysis and design with machine learning methodologies and digital twinning. Designed to drive European semiconductor and automotive industry growth, MADEin4 will facilitate manufacturers’ pre-commercial access to test samples by connecting them with large research and technology organisations.


The metrology domain (which could be considered as the ‘eyes and ears’ for both R&D&I and production) is a key enabler for productivity enhancements in many industries across the electronic components and system (ECS) value chain and have to be an integral part of any Cyber Physical Systems (CPS) which consist of metrology equipment, virtual metrology or Industrial internet of things (IIoT) sensors, edge and high-performance computing (HPC). The requirements from the metrology is to support ALL process steps toward the final product. However, for any given ECS technology, there is a significant trade-off between the metrology sensitivity, precision and accuracy to its productivity. MADEin4 address this deficiency by focusing on two productivity boosters which are independent from the sensitivity, precision and accuracy requirements: • Productivity booster 1: High throughput, next generation metrology and inspection tools development for the nanoelectronics industry (all nodes down to 5nm). This booster will be developed by the metrology equipment’s manufacturers and demonstrated in an industry 4.0 pilot line at imec and address the ECS equipment, materials and manufacturing major challenges (MASP Chapter 15, major challenges 1 – 3). • Productivity booster 2: CPS development which combines Machine Learning (ML) of design (EDA) and metrology data for predictive diagnostics of the process and tools performances predictive diagnostics of the process and tools performances (predictive yield and tools performance). This booster will be developed and demonstrated in an industry 4.0 pilot line at imec, for the 5nm node, by the EDA, computing and metrology partners (MASP Chapter 15, major challenge 4). The same CPS concept will be demonstrated for the ‘digital industries’ two major challenges of the nanoelectronics (all nodes down to 5nm) and automotive end user’s partners (MASP Chapter 9, major challenges 1and 3).


Net EU contribution
€ 2 608 045,90
76705 Rehovot

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Activity type
Private for-profit entities (excluding Higher or Secondary Education Establishments)
Total cost
€ 13 040 229,50

Participants (48)