Periodic Reporting for period 1 - Diramics (InP HEMT technology for Ultra-Low-Noise Amplifiers)
Período documentado: 2019-03-01 hasta 2019-08-31
With our InP HEMT technology, that is based on decades of research at ETH Zurich, we are able to provide transistors with approximately 30% less noise than currently leading GaAs mHEMTs. This is possible thanks to the inherent advantage of using an InP substrate for a low noise HEMT as well as the highly optimized fabrication process. Scaling our fabrication capabilities will allow us to be cost competitive with existing technologies while providing superior performance. The goal of this project is to develop integrated circuit LNAs based on our InP HEMT technology. This will allow for a broad adoption of InP HEMTs in many markets and lead to advances in many fields. Additionally, for future applications at ever higher frequencies we will develop a second generation of scaled InP HEMTs to provide solutions at D-band and beyond.
In the technical feasibility study we worked on benchmarking our technology as well as finding suitable partners for testing & benchmarking our integrated circuits in the next phase. We also examined what the technical requirements are for a fabrication facility that can serve us to produce InP HEMT based products at a competitive price. Finally, we also stated with first evaluations of potential tests needed in order to obtain certifications for our products.
The commercial and financial feasibility focused on an analysis of the low noise amplifier market. We have determined that there is sufficient demand for better solutions and in fact it is the high performance applications that show the strongest growth. Based on this we made a financial forecast to demonstrate that we can offer our technology at competitive prices while remaining profitable.