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Bespoke Resists for Next Generation Nanofabrication

Objective

Interactions with end users of resist technologies suggest there is a market opportunity to develop resists that are tailored for specific applications - which we are calling Bespoke Resists. End users also require careful validation of performance of such bespoke resists. During BERNGEN we will examine possible workflows to achieve such bespoke resists in a manner suitable to supply to a wide range of end users.

Host institution

THE UNIVERSITY OF MANCHESTER
Net EU contribution
€ 150 000,00
Address
OXFORD ROAD
M13 9PL Manchester
United Kingdom

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Activity type
Higher or Secondary Education Establishments
Links
Total cost
No data

Beneficiaries (1)