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Substrate and barrier layer optimisation for cvd-grown thin-film crystalline silicon solar cells ('SUBARO')

Objective

A consortium has been formed by partners stemming from research and industry in order to progress towards the development of a cost-effective thin-film crystalline Si technology based on thermally assisted CVD as the deposition technique for the active crystalline Si-layer. The project focuses on three well-defined substrate options: Si-ribbons, conductive ceramics based on infiltrated SiAlON and insulating ceramics based on SiAlON. After the midterm assessment, the most promising conductive, respectively a one-side contacted monolithic module process. The active layers for these devices will be grown in a specifically developed continuous high-throughput CVD-reactor.

Funding Scheme

CSC - Cost-sharing contracts

Coordinator

INTERUNIVERSITAIR MIKRO-ELEKTRONICA CENTRUM VZW
Address
Kapeldreef 75
3001 Heverlee
Belgium

Participants (8)

BAYER AG
Germany
Address
Keiser Wilhelm Allee 2
51368 Leverkusen
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
France
Address
Rue Du Loess 23, Caressa Jean-paul Délégué Régiona
67037 Strasbourg
DELFT UNIVERSITY OF TECHNOLOGY
Netherlands
Address
17,Feldmannweg 17
2600 GA Delft
EVEREST COATINGS
Netherlands
Address
Van Den Berghlaan 445
2132 AM Hoofddorp
FRAUNHOFER GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E.V.*
Germany
Address
Heidenhofstrasse 2
79110 Freiburg (In Breisgau)
H.C. STARCK GMBH AND CO. KG
Germany
Address
3,Kraftwerkweg 3
79725 Laufenburg
ITALIAN AGENCY FOR NEW TECHNOLOGY, ENERGY AND THE ENVIRONMENT
Italy
Address
Via Angullarese 301
00060 Roma
RWE SCHOTT SOLAR GMBH
Germany
Address
Theresienstrasse 2
74072 Heilbronn