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Content archived on 2024-05-24

Multi-sample epitaxial deposition chamber

Objective

The project aims to develop an European Technology to realize high performances customized reaction chambers for Chemical Vapor Deposition (CVD), and metal organics phase vapor systems. Mainly development is dedicated to R&D on the Epitaxy of composed semiconductors, both III-V and II- VI. The final prototype is an integrated instrument, with an epitaxial chamber suitable to work on 2" wafer, also having scale up facility to 3" or 4" , with high lateral uniformity (better than 1 %) for the deposit thickness and stechiometry. This chamber should also have a geometry suitable to a fast switching of the gaseous gas composition for the growth Atomic Layer Epitaxy applications. The prototype development will pay very much attention to the possible customized applications, so that dimensions and technical specifications will allow an easy scale up to every particular CVD process. The target price of the instrument is highly competitive with respect to the existing instruments.

Fields of science (EuroSciVoc)

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Programme(s)

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Topic(s)

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Call for proposal

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Funding Scheme

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EAW - Exploratory awards

Coordinator

2M STRUMENTI SRL
EU contribution
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Address
Via G. Pontano N.9
00141 ROMA
Italy

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Total cost

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Participants (1)

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