Objective
The project aims to develop an European Technology to realize high performances customized reaction chambers for Chemical Vapor Deposition (CVD), and metal organics phase vapor systems. Mainly development is dedicated to R&D on the Epitaxy of composed semiconductors, both III-V and II- VI. The final prototype is an integrated instrument, with an epitaxial chamber suitable to work on 2" wafer, also having scale up facility to 3" or 4" , with high lateral uniformity (better than 1 %) for the deposit thickness and stechiometry. This chamber should also have a geometry suitable to a fast switching of the gaseous gas composition for the growth Atomic Layer Epitaxy applications. The prototype development will pay very much attention to the possible customized applications, so that dimensions and technical specifications will allow an easy scale up to every particular CVD process. The target price of the instrument is highly competitive with respect to the existing instruments.
Fields of science (EuroSciVoc)
CORDIS classifies projects with EuroSciVoc, a multilingual taxonomy of fields of science, through a semi-automatic process based on NLP techniques.
CORDIS classifies projects with EuroSciVoc, a multilingual taxonomy of fields of science, through a semi-automatic process based on NLP techniques.
- natural sciencesphysical scienceselectromagnetism and electronicssemiconductivity
- natural sciencesmathematicspure mathematicsgeometry
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Call for proposal
Data not availableFunding Scheme
EAW - Exploratory awardsCoordinator
00141 ROMA
Italy