Objetivo
Thin films and, more generally, surface modifications play an important role in modern technological areas such as electronic devices, coatings and tribology. The quality and properties of the films are strongly dependent on the techniques used for deposition. The purpose of this project is to construct a system capable of depositing films in a controlled fashion using ions with a well-defined energy distribution in the range 10-100eV and to investigate the structure, composition and adhesion or the film in relation to the deposition energy and substrate quality and temperature. The energy range selected is above thermal deposition and below the energy involved in ion implantation. In this region, which can be defined as the region for energetic condensation, it should be possible to explore the possibility of producing new materials and structures.
The system should be flexible enough to accept laser ablation sources and possibly ion sputtering sources. The material selected for testing will be carbon and boron nitride. In one case the source will be tested with a conductor and in the other case with an insulator. The objective is to produce C films with mostly sp3 bonds (diamond) and cubic BN.
The Russian partners will carry out the control with all the hardware and software necessary. French participants, will, for comparison purposes, deposit the same substances using ion-beam assisted deposition and conventional sputtering. This group will, in addition, take care of the structural and electrical characterisation. The Italian partners, will contribute to the evaluation of the source and the characterisation of the film produced by using ion beam scattering, Auger and Xps spectroscopy and undertake some transmission electron diffraction studies.
Tema(s)
Convocatoria de propuestas
Data not availableRégimen de financiación
Data not availableCoordinador
41100 MODENA
Italia