Hundred nm CMOS technology

Objective

The work within the HUNT project will focus on the development and evaluation of the main process modules dedicated to the 100 nm CMOS transistor architecture. Significant improvements in transistor architectures will be required to offer competitive drive currents with the reduced supply voltage envisaged for the 0.13 µm generation and below. Next, the integration of the specific front-end CMOS process modules for the future 100 nm CMOS technology is undertaken. This will take into account the maturity of the modules for industrial use with emphasis on the manufacturability and reliability. This will imply the use of 193 nm optical lithography in the realisation of the ultimate goals of HUNT. Using also results of other European projects as ULTRA II, the expected outcome of HUNT is the integration of a high performance 100 nm CMOS front-end technology for logic applications.

Programme(s)

• FP5-IST - Programme for research, technological development and demonstration on a "User-friendly information society, 1998-2002"

Topic(s)

• 1.1.2.-4.8.3 - Processes, equipment and materials

Funding Scheme

CSC - Cost-sharing contracts

Coordinator

INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW

Address

Kapeldreef 75
3001 Leuven
Belgium

Participants (5)

CENTRE COMMUN DE MICROELECTRONIQUE DE CROLLES

France

Address

Zi Du Pre Roux
38190 Crolles

INFINEON TECHNOLOGIES AG

Germany

Address

St. Martin Strasse 53
81609 Muenchen

MARCONI OPTICAL COMPONENTS LIMITED

United Kingdom

Address

One Bruton Street
W1J 6AQ London

PHILIPS ELECTRONICS NEDERLAND B.V.

Netherlands

Address

Boschdijk 525
5621 JG Eindhoven

STMICROELECTRONICS SA

France

Address

29 Boulevard Romain Rolland
92120 Montrouge