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Hundred nm CMOS technology

Objective

The work within the HUNT project will focus on the development and evaluation of the main process modules dedicated to the 100 nm CMOS transistor architecture. Significant improvements in transistor architectures will be required to offer competitive drive currents with the reduced supply voltage envisaged for the 0.13 µm generation and below. Next, the integration of the specific front-end CMOS process modules for the future 100 nm CMOS technology is undertaken. This will take into account the maturity of the modules for industrial use with emphasis on the manufacturability and reliability. This will imply the use of 193 nm optical lithography in the realisation of the ultimate goals of HUNT. Using also results of other European projects as ULTRA II, the expected outcome of HUNT is the integration of a high performance 100 nm CMOS front-end technology for logic applications.

Funding Scheme

CSC - Cost-sharing contracts

Coordinator

INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW
Address
Kapeldreef 75
3001 Leuven
Belgium

Participants (5)

CENTRE COMMUN DE MICROELECTRONIQUE DE CROLLES
France
Address
Zi Du Pre Roux
38190 Crolles
INFINEON TECHNOLOGIES AG
Germany
Address
St. Martin Strasse 53
81609 Muenchen
MARCONI OPTICAL COMPONENTS LIMITED
United Kingdom
Address
One Bruton Street
W1J 6AQ London
PHILIPS ELECTRONICS NEDERLAND B.V.
Netherlands
Address
Boschdijk 525
5621 JG Eindhoven
STMICROELECTRONICS SA
France
Address
29 Boulevard Romain Rolland
92120 Montrouge