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Technologies and Advanced materials for Kick-OFF in FED manufacturing

Objective

The objective of the project is to develop technologies that will enable mass manufacturing of Field Emission Displays (FED) satisfying the requirements of the market in terms of power consumption, brightness, lifetime, colour and cost.

The consortium will combine proven technologies in the area of flat panel displays with some advanced and innovative concepts such as:
-0.5µm gate holes;
- direct deposition of carbon nanotubes on glass;
- semi-conducting and grid-supporting spacers and distributed getters attached to the frame.
The project is organized around research on materials and development of necessary equipments for large area holographic lithography, automatic inspection and placement of spacers.
The consortium brings together companies and institutes with complementary expertise that are ready to take the challenge of building during the course of the project 18 inch demonstrators able to promote the replacement of CRT.

Objectives:
The partners strongly believe that Field Emission Displays (FED) are particularly suited for the substitution of CRT in consumer applications for the medium sizes that are in the range between LCD (20") and plasma (42"). They plan to show that FED can satisfy the market requirements in terms of power consumption, brightness, lifetime, colour, and cost. They will work on technologies that will prepare the next phase of mass manufacturing.
The consortium will combine technologies already known for FED or which have been successful in the manufacturing of other flat panel displays, with a certain number of new concepts especially in the area of cathode formation and packaging. The project deals with specific research on materials, and development of new equipments that will be qualified during the project through demonstrators.

Work description:
The workpackages are centred either on the development of a new equipment or the research of a new combination of materials. First, less than 0.5µm resolution holographic lithography tools will be developed for printing at high throughput. Also included in this workpackage is the fabrication in a very clean environment of high quality holograms.

A second package will study the direct deposition of carbon nanotubes (CNT) on glass by two original routes: polymer-dispersed CNT deposited through a mask and chemical vapour deposition assisted by an extremely local heating.

The best will be selected for the subsequent fabrication of cathodes on a high strain point glass and assembly of a first demonstrator with a 7 inch size.
Additionally, cathodes using indirect CNT will be fabricated and tested in order to select the best option between the different gate technologies for triode-type FED: under-gate, remote-gate and normal-gate structures.

Four work-packages cover issues related to packaging.
The first one deals with research on new glass spacers with semi-conducting behaviour to solve the problems of charging and research on techniques for the fabrication of the grid-supporting spacers necessary in a remote-gate structure. For the handling of the huge quantities of tiny glass spacers, first equipment will be developed for the automatic inspection as a reliable quality control.
The second equipment deals with the alignment, placement and fixing of spacers on the cathode using principles compatible with high throughput. A work-package will work on a new type of glass frame that could incorporate getters distributed all around the periphery of the panel for efficient vacuum conservation and would be compatible with vacuum sealing process by laser.
The final packages cover the assembly of 18 inches CNT demonstrators and their final testing and evaluation.

Milestones:
- M3 Agreement on specifications;
- M8 Semi-conducting spacers qualified-
- M12 Holographic mask equipment ready, Grid supporting spacers, frame and getters qualified;
-M14 HR lithographic equipment;
- M15 Direct CNT demonstrator 7inch size;
- M16 Indirect CNT 18in demonstrators ready for evaluation;
- M18 Final report.

Funding Scheme

CSC - Cost-sharing contracts

Coordinator

SAINT-GOBAIN DISPLAY GLASS
Address
2 Boulevard Lafayette
60150 Thourotte
France

Participants (9)

COMMISSARIAT A L'ENERGIE ATOMIQUE
France
Address
31-33 Rue De La Federation
75752 Paris Cedex 15
CYBERNETIX
France
Address
Rue Albert Einstein Technopole De Chateau Gombert
13382 Domaine De L'annonciade - Marseille
HOLTRONIC TECHNOLOGIES SA
Switzerland
Address
Champs Montants 12B
2074 Marin
MICROFAB AKTIENGESELLSCHAFT
Liechtenstein
Address
Vanolaweg 816
9495 Triesen
SAES GETTERS S.P.A.
Italy
Address
Viale Italia 77
20151 Lainate (Mi)
SAMSUNG SDI CO., LTD
South Korea
Address
Daekyung Bldg. 120, 2-Ka, Taepyung-ro, Chung-ku
100-724 Seoul
THALES AVIONICS SA
France
Address
1 Avenue Carnot
91883 Massy
THE CHANCELLOR, MASTERS AND SCHOLARS OF THE UNIVERSITY OF CAMBRIDGE
United Kingdom
Address
The Old Schools, Trinity Lane
CB21TT Cambridge
THOMSON R & D FRANCE SNC
France
Address
Quai Alphonse Le Gallo 46
92100 Boulogne Billancourt