High Throughput Atomic Layer Chemical Vapour Deposition Batch Equipment using Remote Plasma Enhanced Processing and In-Situ Chamber Clean

Project Information

HALE & RAPID

Grant agreement ID: IST-2001-39154

Project closed

Start date 1 September 2002

End date 28 February 2005

Funded under

• Programme for research, technological development and demonstration on a "User-friendly information society, 1998-2002"

Total cost € 4 541 552,00

EU contribution € 1 859 451,00

Coordinated by

INFINEON TECHNOLOGIES AG
Germany

Programme(s)

• FP5-IST - Programme for research, technological development and demonstration on a "User-friendly information society, 1998-2002"

Topic(s)

• IST-2002-4.8.4 - Industrial micro- and opto-electronic technologies - take-up/ assessment actions

Call for proposal

Data not available

Funding Scheme

ACM - Preparatory, accompanying and support measures

Coordinator

INFINEON TECHNOLOGIES AG

• EU contribution: No data
• Address: ST. MARTIN STRASSE 53 ; 81609 MUENCHEN ; Germany
• Total cost: No data

Participants (4)

ASM INTERNATIONAL N.V.

Netherlands

• EU contribution: No data
• Address: JAN VAN EYCKLAAN 10 ; 3723 BC BILTHOVEN
• Total cost: No data

AUSTRIAMICROSYSTEMS AG

Austria

• EU contribution: No data
• Address: SCHLOSS PREMSTAETTEN, TOBELBADERSTRASSE 30 ; 8141 UNTERPREMSTAETTEN
• Total cost: No data

FRAUNHOFER GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.

Germany

• EU contribution: No data
• Address: HANSASTRASSE 27C ; 80686 MUENCHEN
• Total cost: No data

MOTOROLA, INC., WILMINGTON

Switzerland

• EU contribution: No data
• Address: ROUTE DE FERNEY 207 ; 1218 LE GRAND-SACONNEX
• Total cost: No data