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Development of SiO2 on Si reference materials

Objective



The objectives of the project are the development, manufacture, full characterization and testing of SiO2 on Si specimens with three layer thicknesses with nominal values of 10, 50 and 120 nm, respectively. This should then, if successful, lead to the delivery of SiO2 for the calibration of spectroscopic ellipsometers for the measurement of the thickness of thin films.

STATUS

In progress. The samples have been produced, characterized and analyzed for stability by IMEC. The measurements of their thickness by means of three distinct techniques, namely:

a) Singe Wavelength Ellipsometry (SWE);
b) Spectroscopic Ellipsometry (SE);
c) Transmission Electron Microscopy (TEM);

was then intercompared at different European laboratories.
The SE measurements have shown to be the most more accurate and repeatable. The measured samples have been found to be certifiable for the calibration of ellipsometers: IMEC and RSRE will be in charge of the certification phase.

Funding Scheme

CSC - Cost-sharing contracts

Coordinator

DBP

Participants (10)

IMEC
Belgium
Laboratoire d'Électronique Philips
France
Address
22 Avenue Descartes
94453 Limeil-brevannes
Lamel
Italy
Philips National Laboratory
Netherlands
RUCA
Belgium
Royal Signals and Radar Establishment
United Kingdom
STC Technology Ltd
United Kingdom
Siemens AG
Germany
Address
Otto-hahn-ring 6
81739 München
Sopra
France
Address
68 Rue Pierre Joigneaux
92700 Colombes
Universidad Complutense
Spain