Objectif
The objectives of the project are the development, manufacture, full characterization and testing of SiO2 on Si specimens with three layer thicknesses with nominal values of 10, 50 and 120 nm, respectively. This should then, if successful, lead to the delivery of SiO2 for the calibration of spectroscopic ellipsometers for the measurement of the thickness of thin films.
STATUS
In progress. The samples have been produced, characterized and analyzed for stability by IMEC. The measurements of their thickness by means of three distinct techniques, namely:
a) Singe Wavelength Ellipsometry (SWE);
b) Spectroscopic Ellipsometry (SE);
c) Transmission Electron Microscopy (TEM);
was then intercompared at different European laboratories.
The SE measurements have shown to be the most more accurate and repeatable. The measured samples have been found to be certifiable for the calibration of ellipsometers: IMEC and RSRE will be in charge of the certification phase.
Champ scientifique
Thème(s)
Data not availableAppel à propositions
Data not availableRégime de financement
CSC - Cost-sharing contractsCoordinateur
Allemagne