Descripción del proyecto Next-Generation Nanoelectronics Components and Electronics IntegrationMAGIC has supported the development of e-beam based maskless lithography technology in Europe: Two parallel lithography tool developments for 32nm CMOS and beyond and on lithography infrastructure.In the CMOS manufacturing environment, the mask-based optical lithography technique is up to now driving solution to deal with all industry concerns. Nevertheless, this solution becomes less effective for each new technology node. Effectively, it requires more and more complex and expensive masks due to the introduction of optical proximity correction and phase shift techniques. The blow up of the tool prices play also an important role in the overall cost of ownership of this technique. This trend opens opportunity for the Mask-Less Lithography (ML2) technology, based on multi-beam principles and developped by the two European companies MAPPER and IMS Nanofabrication AG. The cost effective model of the ML2 option in association with the high resolution capability of the electron beam lithography and a reasonable throughput target represents an attractive alternative for lithography and is supported by some key CMOS manufacturers around the world, like TSMC, STMicroelectronics, QIMONDA, TOSHIBA, and Texas Instruments.This project proposes to support the development of ML2 technology in Europe. It is composed of two linked poles. The first one will be focused on MAPPER and IMMS-NANO tools developments with the objective to deliver a first ML2 alpha platform compatible with 32 nm half pitch technology before 2010, aligned with the semiconductor manufacturer requirements. In relation with this activity, the program will develop the required infrastructure for the usage of this tools in an industrial environment. Among the tasks to be addressed, there is a delivery of a reliable software platform to treat the data base preparation and to provide solutions for ML2 related electron proximity effects. The last concern of this project will be to demonstrate the ability to integrate CMOS processes in real manufacturing conditions on the ML2 platform developpeed by the tool partners. Mostrar el objetivo del proyecto Ocultar el objetivo del proyecto In the CMOS manufacturing environment, the mask-based optical lithography technique is up to now the driving solution to deal with all industry concerns. Nevertheless, this solution becomes less effective for each new technology node. Effectively, it requires more and more complex and expensive masks due to the introduction of optical proximity correction and phase shift techniques. The blow up of the tool price plays also an important role in the overall cost of ownership of this technique. This trend opens opportunities for the Mask-Less Lithography (ML2) technology, based on multi-beam principles and developed by the two European companies MAPPER and IMS Nanofabrication AG. The cost effective model of the ML2 option in association with the high resolution capability of the electron lithography and a reasonable throughput target represents an attractive alternative for lithography and is supported by some key CMOS manufacturers around the world, like TSMC, STMicroelectronics, QIMONDA, TOSHIBA, and Texas Instruments...This project proposes to support the development of ML2 technology in Europe. It is composed of two linked poles. The first one will be focused on MAPPER and IMS-NANO tool developments with the objective to deliver a first ML2 alpha platform compatible for 32nm half pitch technology before 2010, aligned with the semiconductor manufacturer requirements. In relation with this activity, the program will develop the required infrastructure for the usage of these tools in an industrial environment. Among the tasks to be addressed, there is the delivery of a reliable software platform to treat the data base preparation and to provide solution for ML2 related electron beam proximity effects. The last concern of this project will be to demonstrate the ability to integrate CMOS processes in real manufacturing conditions on the ML2 platforms developed by the tool partners. Ámbito científico natural sciencescomputer and information sciencessoftwarenatural sciencesphysical scienceselectromagnetism and electronicssemiconductivity Programa(s) FP7-ICT - Specific Programme "Cooperation": Information and communication technologies Tema(s) ICT-2007.3.1 - Next-generation nanoelectronic components and electronics integration Convocatoria de propuestas FP7-ICT-2007-1 Consulte otros proyectos de esta convocatoria Régimen de financiación CP - Collaborative project (generic) Coordinador COMMISSARIAT A L ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES Aportación de la UE € 1 735 076,00 Dirección RUE LEBLANC 25 75015 PARIS 15 Francia Ver en el mapa Región Ile-de-France Ile-de-France Paris Tipo de actividad Research Organisations Contacto administrativo Marie-Laure Page (Ms) Enlaces Contactar con la organización Opens in new window Sitio web Opens in new window Coste total Sin datos Participantes (18) Ordenar alfabéticamente Ordenar por aportación de la UE Ampliar todo Contraer todo FACHHOCHSCHULE VORARLBERG GMBH Austria Aportación de la UE € 126 544,00 Dirección HOCHSCHULSTRASSE 1 6850 Dornbirn Ver en el mapa Región Westösterreich Vorarlberg Rheintal-Bodenseegebiet Tipo de actividad Higher or Secondary Education Establishments Contacto administrativo Johannes Edlinger (Dr.) Enlaces Contactar con la organización Opens in new window Coste total Sin datos IMS NANOFABRICATION AG Austria Aportación de la UE € 1 069 782,00 Dirección SCHREYGASSE 3 1020 WIEN Ver en el mapa Tipo de actividad Private for-profit entities (excluding Higher or Secondary Education Establishments) Contacto administrativo Hans Loeschner (Dr.) Enlaces Contactar con la organización Opens in new window Coste total Sin datos DOW SILICONES BELGIUM Bélgica Aportación de la UE € 0,00 Dirección RUE JULES BORDET PARC INDUSTRIEL ZONE C 7180 Seneffe Ver en el mapa Región Région wallonne Prov. Hainaut Arr. Soignies Tipo de actividad Private for-profit entities (excluding Higher or Secondary Education Establishments) Contacto administrativo Gerard MARQUET (Mr.) Enlaces Contactar con la organización Opens in new window Coste total Sin datos FUJIFILM ELECTRONIC MATERIALS (EUROPE) N. V. Bélgica Aportación de la UE € 24 543,00 Dirección KEETBERGLAAN 1A, HAVENNUMMER 1061 2070 ZWIJNDRECHT Ver en el mapa Tipo de actividad Private for-profit entities (excluding Higher or Secondary Education Establishments) Contacto administrativo EDDY CEELEN (Mr.) Enlaces Contactar con la organización Opens in new window Coste total Sin datos DELONG INSTRUMENTS AS Chequia Aportación de la UE € 851 775,00 Dirección PALACKEHO TR. 3019/153B 61200 BRNO Ver en el mapa Tipo de actividad Private for-profit entities (excluding Higher or Secondary Education Establishments) Contacto administrativo Michal Drsticka (RNDr.) Enlaces Contactar con la organización Opens in new window Coste total Sin datos FRAUNHOFER GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG EV Alemania Aportación de la UE € 1 856 498,00 Dirección HANSASTRASSE 27C 80686 Munchen Ver en el mapa Región Bayern Oberbayern München, Kreisfreie Stadt Tipo de actividad Research Organisations Contacto administrativo Walter KRAUSE (Mr) Enlaces Contactar con la organización Opens in new window Sitio web Opens in new window Coste total Sin datos GLOBALFOUNDRIES Dresden Module One LLC & Co. KG Alemania Aportación de la UE € 43 113,00 Dirección Wilschdorfer Landstrasse 101 01109 Dresden Ver en el mapa Región Sachsen Dresden Dresden, Kreisfreie Stadt Tipo de actividad Private for-profit entities (excluding Higher or Secondary Education Establishments) Contacto administrativo Stephan Krueger (Mr.) Enlaces Contactar con la organización Opens in new window Sitio web Opens in new window Coste total Sin datos INSTITUT FUER MIKROELEKTRONIK STUTTGART Alemania Aportación de la UE € 1 000 176,00 Dirección ALLMANDRING STRASSE 30A 70569 Stuttgart Ver en el mapa Región Baden-Württemberg Stuttgart Stuttgart, Stadtkreis Tipo de actividad Research Organisations Contacto administrativo Manfred Salzmann (-) Enlaces Contactar con la organización Opens in new window Coste total Sin datos QIMONDA DRESDEN GMBH & CO.OHG La participación finalizó Alemania Aportación de la UE € 199 543,00 Dirección KOENIGSBRUECKER STRASSE 180 01099 DRESDEN Ver en el mapa Tipo de actividad Private for-profit entities (excluding Higher or Secondary Education Establishments) Contacto administrativo Uwe Poepping (-) Enlaces Contactar con la organización Opens in new window Coste total Sin datos ASELTA NANOGRAPHICS SA Francia Aportación de la UE € 110 892,00 Dirección PARVIS LOUIS NEEL 7 38000 GRENOBLE Ver en el mapa Región Auvergne-Rhône-Alpes Rhône-Alpes Isère Tipo de actividad Private for-profit entities (excluding Higher or Secondary Education Establishments) Contacto administrativo Olivier PENY (Mr.) Enlaces Contactar con la organización Opens in new window Coste total Sin datos STMICROELECTRONICS CROLLES 2 SAS Francia Aportación de la UE € 374 943,00 Dirección RUE JEAN MONNET 850 38920 Crolles Ver en el mapa Región Auvergne-Rhône-Alpes Rhône-Alpes Isère Tipo de actividad Private for-profit entities (excluding Higher or Secondary Education Establishments) Contacto administrativo Guilaine BOSC (Mrs) Enlaces Contactar con la organización Opens in new window Sitio web Opens in new window Coste total Sin datos SYNOPSYS INTERNATIONAL LIMITED Irlanda Aportación de la UE € 764 151,00 Dirección BLOCK 1 BLANCHARDSTOWN CORPORATE PARK 15 Dublin Ver en el mapa Región Ireland Eastern and Midland Dublin Tipo de actividad Private for-profit entities (excluding Higher or Secondary Education Establishments) Contacto administrativo Watchorn Charles (Mr.) Enlaces Contactar con la organización Opens in new window Coste total Sin datos KLA-TENCOR CORPORATION (ISRAEL) Israel Aportación de la UE € 194 006,00 Dirección HATIKSHORET ST. 23100 Migdal Haemek Ver en el mapa Tipo de actividad Private for-profit entities (excluding Higher or Secondary Education Establishments) Contacto administrativo Adrien Davidson (Mr) Enlaces Contactar con la organización Opens in new window Coste total Sin datos MAPPER LITHOGRAPHY B.V. Países Bajos Aportación de la UE € 3 398 957,00 Dirección COMPUTERLAAN 15 2628 XK DELFT Ver en el mapa Tipo de actividad Private for-profit entities (excluding Higher or Secondary Education Establishments) Contacto administrativo Wim Hofland (Mr.) Enlaces Contactar con la organización Opens in new window Coste total Sin datos Synopsys Armenia CJSC Armenia Aportación de la UE € 0,00 Dirección Arshakunyats 41 0026 Yerevan Ver en el mapa Tipo de actividad Private for-profit entities (excluding Higher or Secondary Education Establishments) Enlaces Contactar con la organización Opens in new window Coste total Sin datos SYNOPSYS SWITZERLAND LLC Suiza Aportación de la UE € 0,00 Dirección Thurgauerstrasse 40 8050 ZURICH Ver en el mapa Tipo de actividad Private for-profit entities (excluding Higher or Secondary Education Establishments) Enlaces Contactar con la organización Opens in new window Coste total Sin datos SYNOPSYS GMBH Alemania Aportación de la UE € 0,00 Dirección KARL HAMMERSCHMIDT STR 85609 ASCHHEIM Ver en el mapa Tipo de actividad Private for-profit entities (excluding Higher or Secondary Education Establishments) Enlaces Contactar con la organización Opens in new window Coste total Sin datos SYNOPSYS NETHERLANDS BV Países Bajos Aportación de la UE € 0,00 Dirección St. Odgerusstraat 3 6045 ROERMOND Ver en el mapa Tipo de actividad Public bodies (excluding Research Organisations and Secondary or Higher Education Establishments) Enlaces Contactar con la organización Opens in new window Coste total Sin datos