Low-cost machines on an atomic scale
Nanopatterning or nanolithography is associated with fabricating defined (patterned) structures on the nanoscale. One of the biggest stumbling blocks to nanostructure development is the lack of a low-cost and efficient manufacturing methodology. The most common method currently used is deep ultraviolet (UV) lithography, which focuses light to ‘carve’ a pattern onto a wafer reminiscent of photography. The ‘Emerging nanopatterning methods’ (NAPA) project was designed to pull together over 80 % of the existing European knowledge related to nanolithography with the goal of creating a library of nanopatterning processes to spur radical innovations in the field. Nanopatterning has widespread use in industries as varied as electronics and biotechnology. The researchers focused on nanoimprint lithography, soft lithography and self-assembly and MEMS-based nanopatterning including materials, tools and simulation of these methods. In addition, they assessed environmental, safety and health (ESH) issues for all materials and processes. The NAPA consortium successfully created a library of the three nanopatterning processes evaluated and developed simulation tools for process optimisation. The library and simulation tools provided low-cost, scalable alternatives to traditional deep UV technology with widespread applicability to information and communication technologies (ICT), pharmaceuticals, biotechnologies, health and medicine. The consortium tested the materials, equipment, processes and techniques via several demonstrators including an optical encoder, a distributed feedback laser (DBF) and a microfluid device. In summary, the NAPA consortium significantly advanced the state of the art for nanopatterning by providing low-cost, high throughput alternatives to deep UV technology. The library and simulation tools should provide a significant boost to the manufacture of nanoscale ‘machines’, enhancing European competitiveness in a very competitive global market.