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Laser Interference Lithography based 4D-printing of Nanomaterials

Project description

DEENESFRITPL

Large-scale laser interference lithography-based printing of 4D nanomaterials

Since its introduction nearly four decades ago, 3D printing has taken the world by storm. As the technology has advanced, the types of materials that can be printed have expanded exponentially. They now include smart materials, particularly smart nanomaterials, giving rise to 4D nanomaterials that can change shape and properties over time in response to inputs such as light or heat. With the support of the Marie Skłodowska-Curie Actions programme, the L4DNANO project will address the limitations of current 4D printing of nanomaterials with a new process paradigm, laser interference lithography-based 4D printing, for mass production of 4D nanomaterials. The new technique will be pioneered in biomedicine and engineering applications.

Objective

By tackling the limitations of the current 4D-printing of nanomaterials, this project seeks to initiate a new process paradigm, laser interference lithograph (LIL) based 4D-printing, for rapidly and accurately producing truly 3D structural and large volume 4D nanomaterials. It achieves this by combining the advantages of laser interference lithograph with the advanced intelligent inks, producing state-of-the-art capacity of 4D nanomaterials manufacturing. This new method has the potential to the mass-production of 4D nanomaterials and to the market intake of the nanomaterials. In our approach, LIL patterning is applied and the patterns are stitched to form truly 3D nanostructures and then the infiltration of intelligent inks is performed. The approach is based on some established principles and prior art gained within the consortium but is yet to be further explored.The project creates new knowledge on LIL and metalens for 3D patterning and nanometrology, bioactivity-toxicity of 4D Nanomaterials and micro-structures influence to battery performance/life.
The research and innovation objectives are to integrate volumetric laser interference lithograph scanning and deep exposure for rapid, accurate, truly 3D structures fabrication, to develop optimal alignment between interference pattern units and across patterned layers based on the state-of-the-art nanometrology and characterisation for accurate formation of large volume 3D nanostructures, and to accomplish controlled infiltration for the formation the 4th dimension of nanomaterials. The new technique will be pioneered on biomedicine and engineering applications. The objectives are ambitious and require international level collaborations. The project addresses the collaborations by initiating a long-term collaboration platform among consortium members and beyond. It also emphasis staff development via various joint research and innovation and training activities, particularly, the carefully arranged secondments.

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Call for proposal

HORIZON-MSCA-2021-SE-01

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Funding Scheme

HORIZON-TMA-MSCA-SE - HORIZON TMA MSCA Staff Exchanges

Coordinator

AARHUS UNIVERSITET
Net EU contribution
€ 211 600,00
Address
NORDRE RINGGADE 1
8000 Aarhus C
Denmark

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Region
Danmark Midtjylland Østjylland
Activity type
Higher or Secondary Education Establishments
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Total cost
No data

Participants (4)

Partners (8)

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Last update: 27 October 2022

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Permalink: https://cordis.europa.eu/project/id/101086227

European Union, 2024