Description du projet
Impression à grande échelle de nanomatériaux 4D par lithographie par interférence laser
Depuis son introduction il y a près de quarante ans, l’impression 3D a déferlé sur le monde. Au fur et à mesure des progrès technologiques, les types de matériaux imprimables se sont multipliés de manière exponentielle. Ils comprennent désormais des matériaux intelligents, en particulier des nanomatériaux intelligents, donnant naissance à des nanomatériaux 4D qui peuvent changer de forme et de propriétés au fil du temps en réponse à des facteurs tels que la lumière ou la chaleur. Avec le soutien du programme Actions Marie Skłodowska-Curie, le projet L4DNANO abordera les limites de l’impression 4D actuelle de nanomatériaux avec un nouveau paradigme de processus, l’impression 4D basée sur la lithographie par interférence laser, pour la production de masse de nanomatériaux 4D. Cette nouvelle technique sera utilisée dans des applications biomédicales et d’ingénierie.
Objectif
By tackling the limitations of the current 4D-printing of nanomaterials, this project seeks to initiate a new process paradigm, laser interference lithograph (LIL) based 4D-printing, for rapidly and accurately producing truly 3D structural and large volume 4D nanomaterials. It achieves this by combining the advantages of laser interference lithograph with the advanced intelligent inks, producing state-of-the-art capacity of 4D nanomaterials manufacturing. This new method has the potential to the mass-production of 4D nanomaterials and to the market intake of the nanomaterials. In our approach, LIL patterning is applied and the patterns are stitched to form truly 3D nanostructures and then the infiltration of intelligent inks is performed. The approach is based on some established principles and prior art gained within the consortium but is yet to be further explored.The project creates new knowledge on LIL and metalens for 3D patterning and nanometrology, bioactivity-toxicity of 4D Nanomaterials and micro-structures influence to battery performance/life.
The research and innovation objectives are to integrate volumetric laser interference lithograph scanning and deep exposure for rapid, accurate, truly 3D structures fabrication, to develop optimal alignment between interference pattern units and across patterned layers based on the state-of-the-art nanometrology and characterisation for accurate formation of large volume 3D nanostructures, and to accomplish controlled infiltration for the formation the 4th dimension of nanomaterials. The new technique will be pioneered on biomedicine and engineering applications. The objectives are ambitious and require international level collaborations. The project addresses the collaborations by initiating a long-term collaboration platform among consortium members and beyond. It also emphasis staff development via various joint research and innovation and training activities, particularly, the carefully arranged secondments.
Champ scientifique
Programme(s)
- HORIZON.1.2 - Marie Skłodowska-Curie Actions (MSCA) Main Programme
Régime de financement
HORIZON-TMA-MSCA-SE - HORIZON TMA MSCA Staff ExchangesCoordinateur
8000 Aarhus C
Danemark