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Sputtering Halide Perovskites for Integration in Monolithic Tandem Solar Cells

Project description

Advancing processes for perovskite-silicon photovoltaic technology

Perovskite-silicon tandem solar cells are emerging as a promising technology in solar energy owing to their high efficiencies and low-cost materials. However, scalability, especially of the perovskite top cell, is still challenging. Funded by the European Research Council, the SPRINT project plans to develop sputtering deposition techniques, which have not yet been explored for halide perovskites. Sputtering deposition is highly industrialised, offering high deposition rates, conformal deposition, and scalability. With this technique, SPRINT hopes to fast track the physical vapor deposition method for a new generation of solar cells, thereby strengthening the European equipment manufacturing and photovoltaic markets.

Objective

Perovskite-silicon tandem solar cells are one of the most promising new technologies in solar energy research, due to their high efficiencies and use of low-cost materials. One attractive way to make these tandems is to grow the wide band gap perovskite on textured silicon solar cells, forming a monolithic tandem. Record efficiencies of 31.25% have been reported for these monolithic tandems, but still on relatively small area devices (1 cm2). To bring this technology closer to the market, it is imperative to start focussing on scalability. Specifically, the perovskite top cell needs to be reliably produced with industrially-validated, scalable deposition methods. This deposition method should also allow high deposition rates and direct integration of the perovskite top cell into textured silicon cells. SPRINT will develop sputtering deposition of these perovskites. Sputtering is a highly industrialized physical vapor deposition (PVD) method that tackles all challenges: high deposition rate, conformal deposition and is scalable. But to date it hasn’t been explored for halide perovskites. SPRINT's goal is to use the knowledge generated in my ERC StG CREATE for halide target fabrication (patent filed) and single target PVD deposition, and apply this to develop a sputtering coating process for inorganic wide band gap perovskites for monolithic integration in tandem devices. SPRINT will bring an innovative solution to key stakeholders in the PV market. Specifically, PV module manufacturers (such as Oxford PV and Meyer Burger) could implement the process into existing sputtering systems in their R&D labs and later into production lines. Vacuum equipment manufacturers (such as Von Ardenne and Demcon TSST) will benefit from the demand for deposition equipment. This will allow fast-tracking a new generation of PV to the market with > 30% efficiency at a lower price point, strengthening the European PV market.

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Topic(s)

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Funding Scheme

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HORIZON-ERC-POC - HORIZON ERC Proof of Concept Grants

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Call for proposal

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(opens in new window) ERC-2022-POC2

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Host institution

UNIVERSITEIT TWENTE
Net EU contribution

Net EU financial contribution. The sum of money that the participant receives, deducted by the EU contribution to its linked third party. It considers the distribution of the EU financial contribution between direct beneficiaries of the project and other types of participants, like third-party participants.

€ 150 000,00
Address
DRIENERLOLAAN 5
7522 NB Enschede
Netherlands

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Region
Oost-Nederland Overijssel Twente
Activity type
Higher or Secondary Education Establishments
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Total cost

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Beneficiaries (1)

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