Objective The REALISE project aims (i) to develop an atomically controlled deposition process for high-k oxide layers as an enabling technology for a variety of innovative integrated circuit technologies and (ii) to advance fundamental knowledge of materials functionality in the areas of thin film growth, oxide-semiconductor interfaces, surface-precursor reactions and atomic-scale characterisation of dielectrics. These two global aims will be achieved by collaborative research across a range of disciplines.No satisfactory process exists for depositing rare earth oxide films as high-k dielectrics at present. The process that is the subject of this project is atomic layer deposition (ALD), the leading technology for deposition of nanometre-scale films.The project aims to overcome the current difficulties and limitations of rare earth oxide ALD, through project goals that span the entire process: design, synthesis, scale-up and testing of suitable precursors; characterisation of film quality and optimisation of deposition parameters. To investigate the functionality of rare earth oxides as dielectrics and to show the utility of ALD in the electronics industry, further goals of REALISE are: deposition onto variously-prepared semiconductor substrates (Si, Ge); high-resolution characterisation of the semiconductor-oxide interface; scale-up of new ALD process to industrially-sized Si wafers; testing of dielectric in capacitors for innovative memory (DRAM, NVM) and wireless (decoupling for RF) applications. REALISE thus brings together unique expertise to achieve urgently-needed materials integration solutions for the European semiconductor industry. Fields of science engineering and technologymaterials engineeringcoating and filmsnatural sciencesphysical scienceselectromagnetism and electronicssemiconductivitysocial scienceseconomics and businessbusiness and managementemployment Programme(s) FP6-NMP - Nanotechnologies and nanosciences, knowledge-based multifunctional materials and new production processes and devices: thematic priority 3 under the 'Focusing and integrating community research' of the 'Integrating and strengthening the European Research Area' specific programme 2002-2006. Topic(s) NMP-2004-IST-NMP-3 - Materials, Equipment and Processes for Production of Nano-Photonic and Nano-Electronic Devices Call for proposal FP6-2004-IST-NMP-2 See other projects for this call Funding Scheme STREP - Specific Targeted Research Project Coordinator UNIVERSITY COLLEGE CORK, NATIONAL UNIVERSITY OF IRELAND, CORK Address Lee maltings Cork Ireland See on map Links Website Opens in new window EU contribution No data Participants (11) Sort alphabetically Sort by EU Contribution Expand all Collapse all HELSINGIN YLIOPISTO Finland EU contribution € 0,00 Address Yliopistonkatu 4 P.O. Box 33 Helsingin yliopisto See on map Links Website Opens in new window Other funding No data THE UNIVERSITY OF LIVERPOOL United Kingdom EU contribution € 0,00 Address Senate house, abercromby square Liverpool See on map Links Website Opens in new window Other funding No data CONSIGLIO NAZIONALE DELLE RICERCHE Italy EU contribution € 0,00 Address Piazzale aldo moro 7 Roma See on map Links Website Opens in new window Other funding No data SAFC HITECH LIMITED United Kingdom EU contribution € 0,00 Address Power road, bromborough Wirral See on map Links Website Opens in new window Other funding No data ASM MICROCHEMISTRY OY Finland EU contribution € 0,00 Address Hämeentie 135a, 3rd floor Helsinki See on map Links Website Opens in new window Other funding No data STMICROELECTRONICS SRL Italy EU contribution € 0,00 Address Via c. olivetti 2 Agrate brianza See on map Links Website Opens in new window Other funding No data QIMONDA DRESDEN GMBH & CO. OHG Germany EU contribution € 0,00 Address Koenigsbruecker strasse 180 10 09 64 Dresden See on map Other funding No data PHILIPS ELECTRONICS NEDERLAND B.V. Netherlands EU contribution € 0,00 Address Boschdijk 525 Postbus 90050 Eindhoven See on map Links Website Opens in new window Other funding No data CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) France EU contribution € 0,00 Address 3, rue michel-ange Paris See on map Links Website Opens in new window Other funding No data NXP SEMICONDUCTORS NEDERLAND B.V. Netherlands EU contribution € 0,00 Address High tech campus 60 Eindhoven See on map Links Website Opens in new window Other funding No data NUMONYX ITALY S.R.L. Italy EU contribution € 0,00 Address Via c. olivetti 2 Agrate brianza See on map Other funding No data