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Combined SIMS-SFM Instrument for the 3-Dimensional Chemical Analysis of Nanostructures

Objectif

The objective of this project is to develop an innovative and novel combination of a new TOF-SIMS with substantially improved lateral resolution and sensitivity, combined with a new metrological high resolution SFM. The two techniques provide complementary information on nanoscale surface chemistry and surface morphology. In combination with a layer by layer removal of material using low energy sputtering, quantitatively measured by SFM, this combined ultra-high vacuum (UHV) instrument will be unique for the 3-dimensional chemical characterisation of nanostructured inorganic as well as organic materials with down to at least 10 nm lateral resolution and down to 1 nm depth resolution. Joint by a novel software for the calculation and display of 3-dimensional distributions of all chemical species, this leads to a totally new “3D NanoChemiscope”.

Appel à propositions

FP7-NMP-2007-SME-1
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Coordinateur

IONTOF TECHNOLOGIES GMBH
Contribution de l’UE
€ 1 769 148,00
Adresse
HEISENBERGSTRASSE 15
48149 Munster
Allemagne

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Région
Nordrhein-Westfalen Münster Münster, Kreisfreie Stadt
Type d’activité
Private for-profit entities (excluding Higher or Secondary Education Establishments)
Contact administratif
Ewald Niehuis (Dr.)
Liens
Coût total
Aucune donnée

Participants (7)