Objetivo
- Improve current version of machine by: (a) reducing minimum wavelength to operate in UV for ultra thin oxide/nitride/oxide multilayers, (b) reducing spot size to 100x200 micron to allow measurements in test pads as well as scribe lines, and (c) incorporating alloy composition determination procedure in software.
- Assess accuracy and precision (repeatability) on a wide range of structures by comparison with off-line measurements.
- Assess ability to discriminate changing layer characteristics both within batches and from batch-to-batch, together with throughput and reliability, by extensive trials on selected representative structures from mainstream CMOS technology demonstrators and advanced Bipolar systems.
- Optimize ease-of-use by customization of analysis methodology for representative structures.
This project will assess, in a process environment, the SOPRA Multi-Layer Monitor (MLM) which is an automatic, clean-room compatible, high throughput, optical monitoring instrument based on multi-channel spectroscopic ellipsometry. The machine is capable of measuring, non-destructively, up to five layers simultaneously on patterned product wafers, providing information on thickness, crystallinity, composition, refractive index and roughness, together with uniformity mapping. The outcome of the project will be a machine with an operator-level methodology for important CMOS/Bipolar process steps with quantified capabilities/benefits.
Ámbito científico
CORDIS clasifica los proyectos con EuroSciVoc, una taxonomía plurilingüe de ámbitos científicos, mediante un proceso semiautomático basado en técnicas de procesamiento del lenguaje natural.
CORDIS clasifica los proyectos con EuroSciVoc, una taxonomía plurilingüe de ámbitos científicos, mediante un proceso semiautomático basado en técnicas de procesamiento del lenguaje natural.
Convocatoria de propuestas
Data not availableRégimen de financiación
ACM - Preparatory, accompanying and support measuresCoordinador
GU14 6TD Farnborough
Reino Unido