Objective
-To measure photolithography overlay with a high precision of 6-8 nm for the 60-80 nm overlay budgets used in 0.25/0.18 micron resolution lithography on 150 to 300 mm wafers.
- High throughput (90 wafers/hour, 5 points), good measurement performance of difficult grainy layers and flat CMP surfaces, and low added contamination (<0.01 particles./cm{2}/pass) are targeted.
- Evaluate fast measurement mode in two directions which calculates average overlay to suppress tool induced shift (TIS) bringing both improved accuracy and good long term repeatability.
The performance of the JMG overlay measurement tool ALARM 2 (evolution of ALARM 1, formerly supplied by Nanomaster) is to be assessed and improved at GRESSI, Grenoble, France. The overall equipment precision necessary to measure overlay figures as required by 0.18/0.25 micron IC technologies and 300 mm wafer handling capability are the main targets of the project
Fields of science (EuroSciVoc)
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Programme(s)
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Multi-annual funding programmes that define the EU’s priorities for research and innovation.
Topic(s)
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Calls for proposals are divided into topics. A topic defines a specific subject or area for which applicants can submit proposals. The description of a topic comprises its specific scope and the expected impact of the funded project.
Call for proposal
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Funding Scheme
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Funding scheme (or “Type of Action”) inside a programme with common features. It specifies: the scope of what is funded; the reimbursement rate; specific evaluation criteria to qualify for funding; and the use of simplified forms of costs like lump sums.
Coordinator
38054 Grenoble 9
France
The total costs incurred by this organisation to participate in the project, including direct and indirect costs. This amount is a subset of the overall project budget.