Extreme UV concept lithographic development system

Programme(s)

• FP4-ESPRIT 4 - Specific research and technological development programme in the field of information technologies, 1994-1998

Topic(s)

• 2.8 - Semiconductors - Building blocks, methods & tools

Funding Scheme

CSC - Cost-sharing contracts

Coordinator

ASM Lithography B.V.

Address

De Run 1110
5503 LA Veldhoven
Netherlands

Participants (2)

CARL ZEISS

Germany

Address

Carl-zeiss-str. 4-54
73447 Oberkochen

Oxford Instruments Plc

United Kingdom

Address

Old Station Road, Eynsham
OX8 1TL Witney