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Nanoscale self-assembled epitaxial nucleation controlled by interference lithography

Objective

By overcoming all the limitations of conventional top-down nanostructuring, the NanoStencil project seeks to initiate a new process paradigm for the production of dense arrays of identical nanostructures of precise size, shape and composition. It achieves this by combining the simplicity of structuring with light, with the advantages of molecular self-assembly, to provide a single step, cost effective and state of the art capability for next-generation ordered arrays of nanostructures. New methods to achieve such structures are a vital requirement for the exploitation of devices in the quantum regime. In our approach, laser interference patterning is applied by means of ultrashort pulses to material surfaces at the nanostructure formation phase, where it acts to modify local reaction processes providing energetically favourable sites for the nucleation of self-assembly. The approach is based on some established principles and prior art gained within the consortium, but is yet to be demonstrated at the device scale.
To achieve in-situ nanostructuring, precision laser interference optics and state of the art pulsed lasers are integrated within materials reactors producing concentrated light patterns with a pitch of fractions of the laser wavelength which then induce local photothermal or photochemical modifications on the growing surface, creating sites for self-assembly. The science objectives of the project are to develop a comprehensive understanding of the absorption of concentrated pulsed light at the nanoscale to understand how this impacts on a growing or reactive surface. The technological objectives are to demonstrate large scale highly ordered arrays of identical nanostructures within four diverse materials systems (InAs quantum dot arrays, patterned SiO2/metallic nanostructures, ZnO nanowires and functional metal oxide nanospots), each of potentially transformative impact within the themes of semiconductor electronic and photonics, sensing and biomaterials.

Call for proposal

H2020-FETOPEN-2016-2017

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Sub call

H2020-FETOPEN-1-2016-2017

Coordinator

THE UNIVERSITY OF SHEFFIELD
Net EU contribution
€ 919 720,00
Address
Firth Court Western Bank
S10 2TN Sheffield
United Kingdom

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Region
Yorkshire and the Humber South Yorkshire Sheffield
Activity type
Higher or Secondary Education Establishments
Non-EU contribution
€ 0,00

Participants (4)

TAMPEREEN KORKEAKOULUSAATIO SR
Finland
Net EU contribution
€ 600 833,75
Address
Kalevantie 4
33100 Tampere

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Region
Manner-Suomi Länsi-Suomi Pirkanmaa
Activity type
Higher or Secondary Education Establishments
Non-EU contribution
€ 0,00
ASOCIACION CENTRO TECNOLOGICO CEIT
Spain
Net EU contribution
€ 581 103,75
Address
Paseo Manuel De Lardizabal 15
20018 San Sebastian

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Region
Noreste País Vasco Gipuzkoa
Activity type
Research Organisations
Non-EU contribution
€ 0,00
UNIVERSITY OF BEDFORDSHIRE
United Kingdom
Net EU contribution
€ 546 875,00
Address
University Square
LU1 3JU Luton

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Region
East of England Bedfordshire and Hertfordshire Luton
Activity type
Higher or Secondary Education Establishments
Non-EU contribution
€ 0,00
INNOLAS LASER GMBH
Germany
Net EU contribution
€ 560 207,50
Address
Justus Von Liebig Ring 8
82152 Krailling

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SME

The organization defined itself as SME (small and medium-sized enterprise) at the time the Grant Agreement was signed.

Yes
Region
Bayern Oberbayern München, Landkreis
Activity type
Private for-profit entities (excluding Higher or Secondary Education Establishments)
Non-EU contribution
€ 0,00