Project description DEENESFRITPL New nano patterning technique offers hope for making large scale patterns with individual molecules The ability to pattern materials at ever-smaller sizes using photolithography is driving advances in nanotechnology. When the feature size of materials is reduced to the nanoscale, individual atoms and molecules can be manipulated to dramatically alter material properties. So far, the highest-resolution nanolithography can generate patterns down to 20 nm. Extreme ultraviolet lithography – a next-generation lithography technology – can deliver even smaller pattern sizes. However, the secondary electron blur from extreme-ultraviolet photons hinders the creation of single molecule patterns. The EU-funded Nanolace project will demonstrate a breakthrough nanolithography technique: Mask-based atom lithography. Two approaches will be pursued: Solid-state masks and optical masks. If successful the project will be the first to use Bose-einstein condensates for lithograpy and the first to demonstrate single-nanometer resolution mask based lithography, revolutionising the world of micro and quantum electronics. Show the project objective Hide the project objective Objective Lithography refers to the transfer of a pattern onto a substrate. Lithography techniques are used in the production of a huge range of devices and materials ranging from microelectronics and MEMS devices to optical metamaterials and smart surfaces for medical and other applications. The ultimate goal and limit of lithography is to obtain fast and large scale patterning which enables the controlled positioning of individual molecules or atoms. This requires fast, large scale single nm resolution patterning. At the moment no techniques are available that can do that. Fast positioning of individual molecules or atoms over large areas can path the way for the creation and industrial application of whole new classes of materials and devices including room temperature quantum electronic devices, electronic metamaterials as well as nano filtration membranes and can push the performance of todays microelectronics. The highest resolution (~20 nm), fast, large scale lithography technique today is photolithography where a photon beam is projected through a mask, so that the pattern from the mask is replicated by direct imaging on a substrate coated with resist. Next generation Extreme Ultra Violet (EUV) lithography uses 92 eV photons and is targeted to deliver 8 nm resolution. The EUV ultimate limit, determined by the secondary electron generation blur, is estimated to be around 6 nm, which does not enable single nm resolution patterning. Further reductions in the photolithography resolution of the patterning would increase the photon energy, exacerbating the secondary blur.In Nanolace, a radical breakthrough to reach nm resolution lithography will be demonstrated: single nm resolution patterns will be generated with solid state and optical masks, proposed by partners in the consortium using metastable and Bose Einstein condensated atoms. Nanolace will be the first demonstration of lithography with a Bose Einstein condensate. Fields of science natural sciencesphysical scienceselectromagnetism and electronicsmicroelectronicsnatural sciencesphysical sciencescondensed matter physicsbose-einstein condensatesnatural sciencesphysical sciencestheoretical physicsparticle physicsphotons Keywords Molecular Beams matter wave lithography resist matter wave optics lithography Programme(s) H2020-EU.1.2. - EXCELLENT SCIENCE - Future and Emerging Technologies (FET) Main Programme H2020-EU.1.2.1. - FET Open Topic(s) FETOPEN-01-2018-2019-2020 - FET-Open Challenging Current Thinking Call for proposal H2020-FETOPEN-2018-2020 See other projects for this call Sub call H2020-FETOPEN-2018-2019-2020-01 Funding Scheme RIA - Research and Innovation action Coordinator UNIVERSITETET I BERGEN Net EU contribution € 678 718,50 Address MUSEPLASSEN 1 5020 Bergen Norway See on map Region Norge Vestlandet Vestland Activity type Higher or Secondary Education Establishments Links Contact the organisation Opens in new window Website Opens in new window Participation in EU R&I programmes Opens in new window HORIZON collaboration network Opens in new window Total cost € 964 490,99 Participants (6) Sort alphabetically Sort by Net EU contribution Expand all Collapse all THE PROVOST, FELLOWS, FOUNDATION SCHOLARS & THE OTHER MEMBERS OF BOARD, OF THE COLLEGE OF THE HOLY & UNDIVIDED TRINITY OF QUEEN ELIZABETH NEAR DUBLIN Ireland Net EU contribution € 445 567,50 Address COLLEGE GREEN TRINITY COLLEGE D02 CX56 DUBLIN 2 See on map Region Ireland Eastern and Midland Dublin Activity type Higher or Secondary Education Establishments Links Contact the organisation Opens in new window Website Opens in new window Participation in EU R&I programmes Opens in new window HORIZON collaboration network Opens in new window Total cost € 445 567,50 THE UNIVERSITY OF BIRMINGHAM United Kingdom Net EU contribution € 481 413,00 Address Edgbaston B15 2TT Birmingham See on map Region West Midlands (England) West Midlands Birmingham Activity type Higher or Secondary Education Establishments Links Contact the organisation Opens in new window Website Opens in new window Participation in EU R&I programmes Opens in new window HORIZON collaboration network Opens in new window Total cost € 481 413,00 NORGES TEKNISK-NATURVITENSKAPELIGE UNIVERSITET NTNU Norway Net EU contribution € 393 953,75 Address HOGSKOLERINGEN 1 7491 Trondheim See on map Region Norge Trøndelag Trøndelag Activity type Higher or Secondary Education Establishments Links Contact the organisation Opens in new window Website Opens in new window Participation in EU R&I programmes Opens in new window HORIZON collaboration network Opens in new window Total cost € 393 953,75 IDRYMA TECHNOLOGIAS KAI EREVNAS Greece Net EU contribution € 899 125,00 Address N PLASTIRA STR 100 70013 Irakleio See on map Region Νησιά Αιγαίου Κρήτη Ηράκλειο Activity type Research Organisations Links Contact the organisation Opens in new window Website Opens in new window Participation in EU R&I programmes Opens in new window HORIZON collaboration network Opens in new window Total cost € 899 125,00 IRRESISTIBLE MATERIALS LTD United Kingdom Net EU contribution € 153 016,25 Address LANGDON HOUSE LANGDON ROAD SA1 8QY Swansea See on map Region Wales West Wales and The Valleys Swansea Activity type Private for-profit entities (excluding Higher or Secondary Education Establishments) Links Contact the organisation Opens in new window Participation in EU R&I programmes Opens in new window HORIZON collaboration network Opens in new window Total cost € 153 016,25 MB SCIENTIFIC AB Sweden Net EU contribution € 304 717,75 Address FALHAGSLEDEN, 61 753 23 Uppsala See on map SME The organization defined itself as SME (small and medium-sized enterprise) at the time the Grant Agreement was signed. Yes Region Östra Sverige Östra Mellansverige Uppsala län Activity type Private for-profit entities (excluding Higher or Secondary Education Establishments) Links Contact the organisation Opens in new window Website Opens in new window Participation in EU R&I programmes Opens in new window HORIZON collaboration network Opens in new window Total cost € 304 717,75