Deliverables
Synthesis of He* prototype resist to be supplied to WP5
Helium Ion Beam ResistSynthesis of Helium Ion Beam Resist
Mask for 50 nm lithographyFabrication of masks for lithography in the resolution range 50 nm
Public website available online and logo of the project created
Report outlining which part of the data will be accessible only to the partners and which part will be open to others in full compliance with an Open-Access policy.
Publications
Author(s):
Eivind Kristen Osestad, Ekaterina Zossimova, Michael Walter, Bodil Holst, Johannes Fiedler
Published in:
Nanoscale Advances, Issue 6, 2024, Page(s) 5337-5347, ISSN 2516-0230
Publisher:
Royal society of chemistry
DOI:
10.1039/d4na00322e
Author(s):
Johannes Fiedler, Adriá Salvador Palau, Eivind Kristen Osestad, Pekka Parviainen and Bodil Holst
Published in:
Machine Learning: Science and Technology, 2023, ISSN 2632-2153
Publisher:
IOP Publishing
DOI:
10.1088/2632-2153/acd988
Author(s):
Johannes Fiedler; Bodil Holst
Published in:
Journal of Physics B: Atomic, Molecular and Optical Physics, Issue 00223700, 2022, ISSN 0022-3700
Publisher:
Institute of Physics
DOI:
10.1088/1361-6455/ac4b41
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