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Mask Based Lithography for Fast, Large Scale Pattern Generation with Nanometer Resolution


Mask for 50 nm lithography

Fabrication of masks for lithography in the resolution range 50 nm

Website online and logo created

Public website available online and logo of the project created

Data Management Plan

Report outlining which part of the data will be accessible only to the partners and which part will be open to others in full compliance with an Open-Access policy.

Searching for OpenAIRE data...