Deliverables Demonstrators, pilots, prototypes (1) Mask for 50 nm lithography Fabrication of masks for lithography in the resolution range 50 nm Websites, patent fillings, videos etc. (1) Website online and logo created Public website available online and logo of the project created Open Research Data Pilot (1) Data Management Plan Report outlining which part of the data will be accessible only to the partners and which part will be open to others in full compliance with an Open-Access policy. Publications Peer reviewed articles (2) Realistic mask generation for matter-wave lithography via machine learning Author(s): Johannes Fiedler, Adriá Salvador Palau, Eivind Kristen Osestad, Pekka Parviainen and Bodil Holst Published in: Machine Learning: Science and Technology, 2023, ISSN 2632-2153 Publisher: IOP Publishing DOI: 10.1088/2632-2153/acd988 An atom passing through a hole in a dielectric membrane: impact of dispersion forces on mask-based matter-wave lithography Author(s): Johannes Fiedler; Bodil Holst Published in: Journal of Physics B: Atomic, Molecular and Optical Physics, Issue 00223700, 2022, ISSN 0022-3700 Publisher: Institute of Physics DOI: 10.1088/1361-6455/ac4b41 Searching for OpenAIRE data... There was an error trying to search data from OpenAIRE No results available
