Mask Based Lithography for Fast, Large Scale Pattern Generation with Nanometer Resolution

Project Information

Nanolace

Grant agreement ID: 863127

DOI 10.3030/863127

EC signature date 24 September 2019

Start date 1 January 2020

End date 31 December 2024

Funded under

• EXCELLENT SCIENCE - Future and Emerging Technologies (FET)

Total cost € 3 642 284,24

EU contribution € 3 356 511,75

Coordinated by

UNIVERSITETET I BERGEN
Norway

Deliverables

Demonstrators, pilots, prototypes (3)

He* prototype resist

Synthesis of He* prototype resist to be supplied to WP5

Helium Ion Beam Resist

Synthesis of Helium Ion Beam Resist

Mask for 50 nm lithography

Fabrication of masks for lithography in the resolution range 50 nm

Websites, patent fillings, videos etc. (1)

Website online and logo created

Public website available online and logo of the project created

Open Research Data Pilot (1)

Data Management Plan

Report outlining which part of the data will be accessible only to the partners and which part will be open to others in full compliance with an Open-Access policy.

Publications

Peer reviewed articles (2)

Realistic mask generation for matter-wave lithography via machine learning

Author(s): Johannes Fiedler, Adriá Salvador Palau, Eivind Kristen Osestad, Pekka Parviainen and Bodil Holst
Published in: Machine Learning: Science and Technology, 2023, ISSN 2632-2153
Publisher: IOP Publishing
DOI: 10.1088/2632-2153/acd988

An atom passing through a hole in a dielectric membrane: impact of dispersion forces on mask-based matter-wave lithography

Author(s): Johannes Fiedler; Bodil Holst
Published in: Journal of Physics B: Atomic, Molecular and Optical Physics, Issue 00223700, 2022, ISSN 0022-3700
Publisher: Institute of Physics
DOI: 10.1088/1361-6455/ac4b41