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Mask Based Lithography for Fast, Large Scale Pattern Generation with Nanometer Resolution


Mask for 50 nm lithography

Fabrication of masks for lithography in the resolution range 50 nm

Website online and logo created

Public website available online and logo of the project created

Data Management Plan

Report outlining which part of the data will be accessible only to the partners and which part will be open to others in full compliance with an Open-Access policy.


Realistic mask generation for matter-wave lithography via machine learning

Author(s): Johannes Fiedler, Adriá Salvador Palau, Eivind Kristen Osestad, Pekka Parviainen and Bodil Holst
Published in: Machine Learning: Science and Technology, 2023, ISSN 2632-2153
Publisher: IOP Publishing
DOI: 10.1088/2632-2153/acd988

An atom passing through a hole in a dielectric membrane: impact of dispersion forces on mask-based matter-wave lithography

Author(s): Johannes Fiedler; Bodil Holst
Published in: Journal of Physics B: Atomic, Molecular and Optical Physics, Issue 00223700, 2022, ISSN 0022-3700
Publisher: Institute of Physics
DOI: 10.1088/1361-6455/ac4b41

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