Mask Based Lithography for Fast, Large Scale Pattern Generation with Nanometer Resolution

Project Information

Nanolace

Grant agreement ID: 863127

DOI

10.3030/863127

Project closed

EC signature date 24 September 2019

Start date 1 January 2020

End date 31 December 2024

Funded under

• EXCELLENT SCIENCE - Future and Emerging Technologies (FET)

Total cost

€ 3 642 284,24

EU contribution

€ 3 356 511,75

Coordinated by

UNIVERSITETET I BERGEN
Norway

CORDIS provides links to public deliverables and publications of HORIZON projects.

Links to deliverables and publications from FP7 projects, as well as links to some specific result types such as dataset and software, are dynamically retrieved from OpenAIRE .

Deliverables

Demonstrators, pilots, prototypes (4)

He* prototype resist

Synthesis of He* prototype resist to be supplied to WP5

Helium Ion Beam Resist

Synthesis of Helium Ion Beam Resist

Mask for 50 nm lithography

Fabrication of masks for lithography in the resolution range 50 nm

Program for mask calculations

Design of program with user interface for mask calculations for use in future lithography instruments

Websites, patent fillings, videos etc. (1)

Website online and logo created

Public website available online and logo of the project created

Open Research Data Pilot (1)

Data Management Plan

Report outlining which part of the data will be accessible only to the partners and which part will be open to others in full compliance with an Open-Access policy.

Publications

Peer reviewed articles (5)

Atomic diffraction by nanoholes in hexagonal boron nitride

Author(s): Eivind Kristen Osestad, Ekaterina Zossimova, Michael Walter, Bodil Holst, Johannes Fiedler
Published in: Nanoscale Advances, Issue 6, 2024, Page(s) 5337-5347, ISSN 2516-0230
Publisher: Royal society of chemistry
DOI: 10.1039/d4na00322e

Testing the validity of supersonic molecular beam modeling in the high-throughput range using an Even-Lavie valve

Author(s): Simen K. Hellner, Sabrina D. Eder, Gianangelo Bracco, Bodil Holst
Published in: Physical Review A, Issue 109, 2024, ISSN 2469-9926
Publisher: American Physical Society (APS)
DOI: 10.1103/physreva.109.032813

Realistic mask generation for matter-wave lithography via machine learning

Author(s): Johannes Fiedler, Adriá Salvador Palau, Eivind Kristen Osestad, Pekka Parviainen and Bodil Holst
Published in: Machine Learning: Science and Technology, 2023, ISSN 2632-2153
Publisher: IOP Publishing
DOI: 10.1088/2632-2153/acd988

Atomtronic Matter-Wave Lensing

Author(s): Saurabh Pandey, Hector Mas, Georgios Vasilakis, Wolf von Klitzing
Published in: Physical Review Letters, Issue 126, 2025, ISSN 0031-9007
Publisher: American Physical Society
DOI: 10.1103/physrevlett.126.170402

An atom passing through a hole in a dielectric membrane: impact of dispersion forces on mask-based matter-wave lithography

Author(s): Johannes Fiedler; Bodil Holst
Published in: Journal of Physics B: Atomic, Molecular and Optical Physics, Issue 00223700, 2022, ISSN 0022-3700
Publisher: Institute of Physics
DOI: 10.1088/1361-6455/ac4b41