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Content archived on 2024-04-19

Monitoring of trace alkoxides in crystal growth and epitaxy

Objective



An urgent need exists for the development of a new monitoring technique for the highest possible purity gases and liquids used in metalorganic chemical vapor deposition (MOCVD). MOCVD techniques are used in the deposition of a variety of industrial materials, including II-VI and III-V compounds for optoelectronics and magnetooptics applications. Both the range of applications and the ultimate performance of materials made by MOCVD are limited by the lack of a sensitive in-situ and on-line monitoring techniques. Metalorganic compounds are often highly reactive towards atmospheric oxygen and water vapour, readily degrading to form oxygen-containing species, which cause undesirable contamination in the product material. Oxygen contamination can significantly degrade the performance of the materials grown. The main objectives of the proposers are to develop such a monitoring technique for precursor production and end-use in a coatings system, thereby achieving an order of magnitude improvement in the current state of the art. Demonstrations will be carried out at SME sites; the results of the project will be disseminated to a wide audience.
Furthermore, each proposer expects to gain considerable industrial benefits, including increased sales of higher purity metalorganics, increased sales of MOCVD equipment utilizing high purity alkyls and monitoring equipment, and the worldwide marketing of the infrared monitor to MOCVD research centres.

Fields of science (EuroSciVoc)

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Programme(s)

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Topic(s)

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Call for proposal

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Funding Scheme

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CSC - Cost-sharing contracts

Coordinator

Epichem Ltd
EU contribution
No data
Address
Power Road Bromborough
L62 3QF Wirral
United Kingdom

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Total cost

The total costs incurred by this organisation to participate in the project, including direct and indirect costs. This amount is a subset of the overall project budget.

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