Objectif
The main challenge in the development of a thin-film crystalline silicon solar cell is to find an industrially applicable process for the deposition of polycrystalline silicon films of sufficient structural and electronic quality. In this project a two-step process is proposed as a novel approach: Preparation of large-grained Si seed layers on glass and ceramics by metal - induced crystallization (MIC) on which subsequently Si is epitaxially grown by electron cyclotron resonance chemical vapour deposition (low temperature path) and chemical vapour deposition (high temperature path). Targeting at an efficiency of 12% these layers will be used to make efficient solar cells. It is planned to present a mini-module with an efficiency of 10% by end of the project. This innovative approach could result in a crystalline Si thin-film technology with a cost potential below 1 Euro/Wp.
Champ scientifique
Appel à propositions
Data not availableRégime de financement
CSC - Cost-sharing contractsCoordinateur
12489 BERLIN
Allemagne