Objectif
The project aims to develop an instrument for X-Ray diffractometry and X-Ray reflectivity dedicated to measurements of film thickness, crystalline phase, texture and residual stress of supported thin film dedicated to microelectroncis materials and devices. The design of such instrument will address the need of a non-destructive, fast and user friendly technique able to characterize thin film for the microelectronics industry. The project aims to provide a tool that overcomes the intrinsic limitation that ellipsometry has on ultra thin film thickness measurements, providing additional fundamental information on this films and delivering them in a user friendly form facilitating development of new processes in microelectronics. An expert system will be developed where appropriate computing algorithm for data interpretation and a friendly graphical user interface will be optimized according to the need of the end user.
Champ scientifique
Appel à propositions
Data not availableRégime de financement
CSC - Cost-sharing contractsCoordinateur
20041 AGRATE BRIANZA
Italie