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SILICON CARBIDE-SILICON NITRIDE COMPOSITE COATINGS WITH IMPROVED ADHESION PROPERTIES PRODUCED BY A PLASMA ENCHANCED CVD PROCESS

Objective

AIM OF THE PROPOSED PROJECT IS TO PREPARE HYBRID SIC-SI3N4 COATINGS, AND TO STU DY THEIR PROPERTIES AS FUNCTION OF COMPOSITION AND PROCESS CONDITIONS. SPECIAL ATTENTION WILL PAID TO THE IMPROVEMENT OF ADHERENCE CHARACTERISTICS.
The project met its goal of developing a new generation of substrate coatings that can be applied to a number of substrates at low temperatures. In addition to testing several deposition and substrate materials, a hydrogen-nitrogen etching process was developed and proved to increase adhesion.

A COMPOSITE SIC-SI3N4 COATING IS VERY INTERESTING BECAUSE OF ITS COMBINED PROPERTIES. FOR INSTANCE INCREASE OF THERMAL AND ELECTRICAL CONDUCTIVITIES, RELAXATION OF INTERNAL STRESS CAN BE OBSERVED WHEN SIC IS INTRODUCED INTO SI3N4. ALSO GOOD WEAR AND EROSION RESISTANCE CAN BE EXPECTED. BY USING A PLASMA ENHANCED CVD (PECVD) PROCESS IT IS POSSIBLE TO SYNTHESIZE THESE FILMS AT PROCESSING TEMPERATURES WELL BELOW 500 CELSIUS DEGREES. IN THIS WAY A VARIETY OF SUBSTRATES WHICH CANNOT BE COATED BY CONVENTIONAL CVD MAY BE USED. THE RADIO-FREQUENCY DISCHARGE USED DURING CVD WITH PLASMA EXCITATION IS A VERY EFFICIENT MEANS OF REMOVING CONTAMINANTS FROM EG METAL SUBSTRATES. IN THIS WAY A ONE-STEP PROCESS COMBINES SUBSTRATE CLOANING AND COATING. THIS WILL IMPROVE THE ADHESION OF THE COMPOSITE COATING.

Funding Scheme

CSC - Cost-sharing contracts

Coordinator

Tempress BV
Address

7903 AG Hoogeveen
Netherlands

Participants (3)

Enterprise Ireland - Trading as Bioresearch Ireland
Ireland
Address
Glasnevin
9 Dublin
Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek
Netherlands
Address
97,Schoenmakerstraat
2600 JA Delft
Tekscan Ltd.
Ireland
Address
Rossa Avenue Campus
30 Cork