Obiettivo AIM OF THE PROPOSED PROJECT IS TO PREPARE HYBRID SIC-SI3N4 COATINGS, AND TO STU DY THEIR PROPERTIES AS FUNCTION OF COMPOSITION AND PROCESS CONDITIONS. SPECIAL ATTENTION WILL PAID TO THE IMPROVEMENT OF ADHERENCE CHARACTERISTICS.The project met its goal of developing a new generation of substrate coatings that can be applied to a number of substrates at low temperatures. In addition to testing several deposition and substrate materials, a hydrogen-nitrogen etching process was developed and proved to increase adhesion.A COMPOSITE SIC-SI3N4 COATING IS VERY INTERESTING BECAUSE OF ITS COMBINED PROPERTIES. FOR INSTANCE INCREASE OF THERMAL AND ELECTRICAL CONDUCTIVITIES, RELAXATION OF INTERNAL STRESS CAN BE OBSERVED WHEN SIC IS INTRODUCED INTO SI3N4. ALSO GOOD WEAR AND EROSION RESISTANCE CAN BE EXPECTED. BY USING A PLASMA ENHANCED CVD (PECVD) PROCESS IT IS POSSIBLE TO SYNTHESIZE THESE FILMS AT PROCESSING TEMPERATURES WELL BELOW 500 CELSIUS DEGREES. IN THIS WAY A VARIETY OF SUBSTRATES WHICH CANNOT BE COATED BY CONVENTIONAL CVD MAY BE USED. THE RADIO-FREQUENCY DISCHARGE USED DURING CVD WITH PLASMA EXCITATION IS A VERY EFFICIENT MEANS OF REMOVING CONTAMINANTS FROM EG METAL SUBSTRATES. IN THIS WAY A ONE-STEP PROCESS COMBINES SUBSTRATE CLOANING AND COATING. THIS WILL IMPROVE THE ADHESION OF THE COMPOSITE COATING. Campo scientifico ingegneria e tecnologiaingegneria elettrica, ingegneria elettronica, ingegneria informaticaingegneria informaticatelecomunicazionitecnologia radiofrequenza radioscienze naturaliscienze fisicheelettromagnetismo ed elettronicaingegneria e tecnologiaingegneria dei materialicompositiingegneria e tecnologiaingegneria dei materialirivestimenti e pellicolescienze naturaliscienze chimichechimica inorganicametalloidi Programma(i) FP1-BRITE - Multiannual research and development programme (EEC) in the fields of basic technological research and the applications of new technologies (BRITE), 1985-1988 Argomento(i) Data not available Invito a presentare proposte Data not available Meccanismo di finanziamento CSC - Cost-sharing contracts Coordinatore Tempress BV Indirizzo 7903 AG Hoogeveen Paesi Bassi Mostra sulla mappa Contributo UE Nessun dato Partecipanti (3) Classifica in ordine alfabetico Classifica per Contributo UE Espandi tutto Riduci tutto Enterprise Ireland - Trading as Bioresearch Ireland Irlanda Contributo UE € 0,00 Indirizzo Glasnevin 9 Dublin Mostra sulla mappa Altri finanziamenti Nessun dato Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek Paesi Bassi Contributo UE € 0,00 Indirizzo 97,schoenmakerstraat 2600 JA Delft Mostra sulla mappa Altri finanziamenti Nessun dato Tekscan Ltd. Irlanda Contributo UE € 0,00 Indirizzo Rossa avenue campus 30 Cork Mostra sulla mappa Altri finanziamenti Nessun dato