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Content archived on 2024-05-21

Expanding thermal plasma deposition of silicon dioxide films for microelectronic devices.

Fields of science (EuroSciVoc)

Topic(s)

Data not available

Call for proposal

Data not available

Funding Scheme

RGI - Research grants (individual fellowships)

Coordinator

EINDHOVEN UNIVERSITY OF TECHNOLOGY
EU contribution
No data
Address
Den Dolech 2
5600 MB EINDHOVEN
Netherlands
Total cost
No data