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Radical Innovation Maskless Nanolithography

Objective

The STREP proposal Radical Innovation Maskless Nanolithography (RIMANA) aims to research and develop a key maskless nano-patterning technology for low to medium volume production, essential for the semiconductor industry and emerging nanotechnology industry.

RIMANA is driven by two global industrial needs:

- An ML2 tool for short run and low to medium volume leading edge device manufacturers (Logic, ASIC, Silicon Foundries)
- A fast Mask Writer for the leading edge high volume device manufacturers (MPU, DRAM, Logic)

Both global industrial needs are addressed by the proposed RIMANA project with the following overall S/T objectives and work plans:

- Concept and realisation of a new, highly innovative compact APS (Programmable Aperture Plate System), including high-speed electronics with the ability to generate a massive parallelisation of electron beams for the 32nm technology node and beyond
- Concept and realization of Data Path improvements to achieve higher data rates
- Design and generation of test benches to demonstrate sub-32nm node ML2 high throughput capabilities in resist
- Brainstorm of results with perspectives for potential industrial realisation

The key challenges will be to explore and develop essential elements for the massive parallelisation of electron-beams and electron-optics, retaining ultimate resolution down to the nanometre scale, while minimising throughput-resolution trade-offs.

The project will be carried out by a strong and diversified team from industry, academia and acclaimed European research institutes, under the leadership of IMS Nano-fabrication GmbH, an SME with extensive experience in cutting-edge charged particle nano-fabrication research and technology.

RIMANA is harmonised completely with the FP6 strategic objective IST NMP-3. In particular, RIMANA addresses the need for "maskless nano-patterning for low to medium volume production for the 32nm node and beyond".

Coordinator

IMS NANOFABRICATION GMBH

Address

Schreygasse 3
1020 Wien

Austria

Administrative Contact

Gerhard GROSS

Participants (7)

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ARC SEIBERSDORF RESEARCH GMBH

Austria

DELONG INSTRUMENTS AS

Czechia

FACHHOCHSCHULE VORARLBERG GMBH

Austria

Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V.

Germany

INSTITUTE OF MICROELECTRONICS TECHNOLOGY RAS

Russia

TECHNION - ISRAEL INSTITUTE OF TECHNOLOGY

Israel

USTAV INFORMATIKY, SLOVENSKA AKADEMIA VIED

Slovakia

Project information

Grant agreement ID: 17133

  • Start date

    1 October 2005

  • End date

    30 September 2008

Funded under:

FP6-NMP

  • Overall budget:

    € 6 210 274

  • EU contribution

    € 3 437 168

Coordinated by:

IMS NANOFABRICATION GMBH

Austria