Obiettivo The STREP proposal Radical Innovation Maskless Nanolithography (RIMANA) aims to research and develop a key maskless nano-patterning technology for low to medium volume production, essential for the semiconductor industry and emerging nanotechnology industry.RIMANA is driven by two global industrial needs:- An ML2 tool for short run and low to medium volume leading edge device manufacturers (Logic, ASIC, Silicon Foundries)- A fast Mask Writer for the leading edge high volume device manufacturers (MPU, DRAM, Logic)Both global industrial needs are addressed by the proposed RIMANA project with the following overall S/T objectives and work plans:- Concept and realisation of a new, highly innovative compact APS (Programmable Aperture Plate System), including high-speed electronics with the ability to generate a massive parallelisation of electron beams for the 32nm technology node and beyond- Concept and realization of Data Path improvements to achieve higher data rates- Design and generation of test benches to demonstrate sub-32nm node ML2 high throughput capabilities in resist- Brainstorm of results with perspectives for potential industrial realisationThe key challenges will be to explore and develop essential elements for the massive parallelisation of electron-beams and electron-optics, retaining ultimate resolution down to the nanometre scale, while minimising throughput-resolution trade-offs.The project will be carried out by a strong and diversified team from industry, academia and acclaimed European research institutes, under the leadership of IMS Nano-fabrication GmbH, an SME with extensive experience in cutting-edge charged particle nano-fabrication research and technology.RIMANA is harmonised completely with the FP6 strategic objective IST NMP-3. In particular, RIMANA addresses the need for "maskless nano-patterning for low to medium volume production for the 32nm node and beyond". Campo scientifico engineering and technologynanotechnologynatural sciencesphysical scienceselectromagnetism and electronicssemiconductivitynatural scienceschemical sciencesinorganic chemistrymetalloids Programma(i) FP6-NMP - Nanotechnologies and nanosciences, knowledge-based multifunctional materials and new production processes and devices: thematic priority 3 under the 'Focusing and integrating community research' of the 'Integrating and strengthening the European Research Area' specific programme 2002-2006. Argomento(i) Data not available Invito a presentare proposte Data not available Meccanismo di finanziamento STREP - Specific Targeted Research Project Coordinatore IMS NANOFABRICATION GMBH Contributo UE Nessun dato Indirizzo SCHREYGASSE 3 1020 WIEN Austria Mostra sulla mappa Costo totale Nessun dato Partecipanti (7) Classifica in ordine alfabetico Classifica per Contributo UE Espandi tutto Riduci tutto ARC SEIBERSDORF RESEARCH GMBH Austria Contributo UE Nessun dato Indirizzo Kramergasse 1 WIEN Mostra sulla mappa Costo totale Nessun dato DELONG INSTRUMENTS AS Cechia Contributo UE Nessun dato Indirizzo BULHARSKA 48 61200 BRNO Mostra sulla mappa Costo totale Nessun dato FACHHOCHSCHULE VORARLBERG GMBH Austria Contributo UE Nessun dato Indirizzo Achstrasse 1 DORNBIRN Mostra sulla mappa Costo totale Nessun dato Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V. Germania Contributo UE Nessun dato Indirizzo Hansastrasse 27C MUENCHEN Mostra sulla mappa Costo totale Nessun dato INSTITUTE OF MICROELECTRONICS TECHNOLOGY RAS Russia Contributo UE Nessun dato Indirizzo Moscow District CHERNOGOLOVKA Mostra sulla mappa Costo totale Nessun dato TECHNION - ISRAEL INSTITUTE OF TECHNOLOGY Israele Contributo UE Nessun dato Indirizzo Technion City HAIFA Mostra sulla mappa Costo totale Nessun dato USTAV INFORMATIKY, SLOVENSKA AKADEMIA VIED Slovacchia Contributo UE Nessun dato Indirizzo Dubravska Cesta 9 BRATISLAVA Mostra sulla mappa Costo totale Nessun dato