The 'Novel functional polymer materials for MEMS and NEMS applications' (Novopoly) project set out to increase the functionality of materials while maintaining excellent micropatterning capabilities. The EU-funded project thus worked to develop new functional materials for use in microsystems (MEMS) and nanosystems (NEMS) technology applications. Feasibility studies were conducted for various targeted applications. Focusing on materials design and synthesis, Novopoly activities also addressed processing and structuring issues. As such, a parallel objective was to develop, improve and develop novel patterning and structuring methods for select materials in MEMS and NEMS. The first step was to add functionality to existing photostructurable polymers like SU-8, and to resolve the limitations of existing systems. These include mechanical and electrical conductivity and high-temperature stability properties. Classic methods were adapted and innovative methods developed for the specific requirements of the new materials and processes that have the potential to enable a wide range of MEMS and NEMS applications. Novopoly's outcomes stand to have a considerable impact in the fields of MEMS and NEMS by reducing costs, simplifying fabrication processes and offering enhanced properties.