1.55 µm high gain epitaxial wafers based on novel low-dimensional quantum dot (QD) active material offer potentially several advantages over wafers based on conventional quantum well active material.
This includes innovation potential owing to the ability to engineer QD active material properties for telecommunication applications, including properties like low sensitivity to optical feedback, designed chirp properties including low frequency chirp or semi-cooled operation capability.
Optimization of growth conditions and designs allowed demonstrating high gain active layers which are compatible with directly modulated laser fabrication for 10 GBit/s data transmission at 1.55 µm.
In addition, QD material engineering has been established which allows to provide QD material which could be tailored in a wide range to customer specifications.