Project description
Efficiently driving plasmas for advanced semiconductor devices
Extreme ultraviolet (EUV) light sources play a crucial role in the production of advanced semiconductor devices. These devices currently rely on EUV lithography (EUVL), a process with a high energy footprint in part owing to the use of gas lasers. Replacing these with more efficient solid-state may significantly reduce the energy footprint. However, determining the optimal wavelengths and plasma ‘recipes’ involves understanding complex physics. Funded by the European Research Council, the MOORELIGHT project aims to delve deeper into this issue. Researchers will deliver the missing insight that is required to efficiently and reliably power next-generation solid-state-laser-driven EUV light sources. Project findings will not only make a significant impact on related scientific fields but also pave the way for sustainably powering future EUVL technology.
Objective
Advanced semiconductor devices are produced using extreme ultraviolet (EUV) light at just 13.5nm wavelength. This small wavelength enables patterning the smallest and smartest features on chips. The recent revolutionary introduction of EUV lithography (EUVL) was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the digital age. EUVL is powered by light that is produced in the interaction of high-energy CO2-gas laser pulses with molten tin microdroplets. The use of such lasers however leads to unsustainably low overall efficiency in converting electrical power to useful EUV light: delivering a watt of EUV power at the silicon wafer level currently has a megawatt footprint. Replacing gas lasers with much more efficient solid-state lasers will significantly reduce this footprint. It is currently however unclear what laser wavelength, and what plasma ‘recipe’ should be used. This is because we lack understanding of the underlying complex physics.
MOORELIGHT will deliver the missing insight that is required to efficiently and reliably power next-generation solid-state-laser-driven EUV light sources. (1) We will obtain understanding of phase changes and fragmentation of laser-impacted liquid thin tin targets and develop capabilities for laser-tailoring targets. (2) We will use tailored targets to investigate how these couple to laser light of variable wavelength and spatiotemporal profile to produce hot-and-dense plasma. This will provide insight through experiments and modeling into the optimum plasma recipe for producing EUV light, in tandem with efforts (3) to advance predictive plasma modeling by finding the elusive, atomic origins of the EUV light. Individually, these objectives will significantly impact their related fields of science and technology. Combined, they will enable to sustainably power tomorrow’s EUVL, and help realize the EU’s ambitions regarding its technological leadership in nanotechnology.
Fields of science
- engineering and technologynanotechnology
- natural scienceschemical sciencesinorganic chemistrypost-transition metals
- natural sciencesphysical scienceselectromagnetism and electronicssemiconductivity
- natural scienceschemical sciencesinorganic chemistrymetalloids
- natural sciencesphysical sciencesopticslaser physics
Keywords
Programme(s)
- HORIZON.1.1 - European Research Council (ERC) Main Programme
Funding Scheme
HORIZON-ERC - HORIZON ERC GrantsHost institution
3526 KV Utrecht
Netherlands