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Next-Generation Light Source: Driving plasmas to power tomorrow’s nanolithography

Project description

Efficiently driving plasmas for advanced semiconductor devices

Extreme ultraviolet (EUV) light sources play a crucial role in the production of advanced semiconductor devices. These devices currently rely on EUV lithography (EUVL), a process with a high energy footprint in part owing to the use of gas lasers. Replacing these with more efficient solid-state may significantly reduce the energy footprint. However, determining the optimal wavelengths and plasma ‘recipes’ involves understanding complex physics. Funded by the European Research Council, the MOORELIGHT project aims to delve deeper into this issue. Researchers will deliver the missing insight that is required to efficiently and reliably power next-generation solid-state-laser-driven EUV light sources. Project findings will not only make a significant impact on related scientific fields but also pave the way for sustainably powering future EUVL technology.

Objective

Advanced semiconductor devices are produced using extreme ultraviolet (EUV) light at just 13.5nm wavelength. This small wavelength enables patterning the smallest and smartest features on chips. The recent revolutionary introduction of EUV lithography (EUVL) was the culmination of several decades of collaborative work between industry and science a Project Apollo of the digital age. EUVL is powered by light that is produced in the interaction of high-energy CO2-gas laser pulses with molten tin microdroplets. The use of such lasers however leads to unsustainably low overall efficiency in converting electrical power to useful EUV light: delivering a watt of EUV power at the silicon wafer level currently has a megawatt footprint. Replacing gas lasers with much more efficient solid-state lasers will significantly reduce this footprint. It is currently however unclear what laser wavelength, and what plasma recipe should be used. This is because we lack understanding of the underlying complex physics.

MOORELIGHT will deliver the missing insight that is required to efficiently and reliably power next-generation solid-state-laser-driven EUV light sources. (1) We will obtain understanding of phase changes and fragmentation of laser-impacted liquid thin tin targets and develop capabilities for laser-tailoring targets. (2) We will use tailored targets to investigate how these couple to laser light of variable wavelength and spatiotemporal profile to produce hot-and-dense plasma. This will provide insight through experiments and modeling into the optimum plasma recipe for producing EUV light, in tandem with efforts (3) to advance predictive plasma modeling by finding the elusive, atomic origins of the EUV light. Individually, these objectives will significantly impact their related fields of science and technology. Combined, they will enable to sustainably power tomorrows EUVL, and help realize the EUs ambitions regarding its technological leadership in nanotechnology.

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Keywords

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Programme(s)

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Topic(s)

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Funding Scheme

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HORIZON-ERC - HORIZON ERC Grants

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Call for proposal

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(opens in new window) ERC-2022-COG

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Host institution

STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN
Net EU contribution

Net EU financial contribution. The sum of money that the participant receives, deducted by the EU contribution to its linked third party. It considers the distribution of the EU financial contribution between direct beneficiaries of the project and other types of participants, like third-party participants.

€ 2 000 000,00
Total cost

The total costs incurred by this organisation to participate in the project, including direct and indirect costs. This amount is a subset of the overall project budget.

€ 2 000 000,00

Beneficiaries (1)

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