CORDIS - Résultats de la recherche de l’UE
CORDIS

Laser Nanoscale Manufacturing

Final Report Summary - LASERNAMI (Laser Nanoscale Manufacturing)

The project “Laser Nanoscale Manufacturing (LaserNaMi)” focuses researcher exchange between the three partners in EU and four in China. During the three years duration of the project a total of 173 man months of researcher visits were conducted. The results are reported in 40 scientific journal publications, 12 patents and numerous meetings, conferences and workshops.
The research collaboration was focused on new maskless laser manufacturing technologies for low cost and high efficiency preparation of nanostructured surfaces and components. These include periodic structures and other arbitrary features for both 2D and 3D applications. The target feature size will be down to ~10 nm in the selected applications. Laser nanoscale manufacturing is of great importance in nanoscience and -technology applications for large area, low cost and high-efficiency fabrication. Unlike the immersion approaches, the approach developed in LaserNaMi is simple and cost effective. The technology has a long working distance, flexible for different surface structures and suitable for both 2D and 3D applications. The advantages are unique compared with other technologies such as ion beam lithography (IBL), electron beam lithography (EBL), scanning probe lithography (SPL) and nanoimprint lithography (NIL).

The following achievements are highlighted:
- Formation of multiple beam interference patterns for nanolithography has been studied. Based on computer modeling a four-beam He-Ne laser interference system was implemented.
- Interference lithography system using a new multi-wavelength laser with wavelengths of 213 nm, 266 nm, 355 nm, 532 nm and 1064 nm including 2-6 separate beams was built.
- Laser direct writing with superresolution beyond of diffraction limit has been developed. This system utilizes optimized interaction between the beam shape of the laser and ablation threshold of the irradiated materials, to overcome the diffraction limit. Resolution down to 50 nm has been achieved.
- The developed lithography systems were applied in fabrication of nano gratings, anti-counterfeiting security markers, nanoimprint templates, self-cleaning and anti-reflection surfaces and nanosensors

Website: www.lasernami.org