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Content archived on 2024-04-16

High Precision, Automated CD Metrology Station

Objective

The goal of the METRICS project was to tackle the major risk elements in the development of a critical dimension (CD) measuring tool, based on electron optics, for the sub-half micron regime.
The goal of the METRICS project was to tackle the major risk elements in the development of a critical dimension (CD) measuring tool, based on electron optics, for the sub-half micron regime.
In the course of the project, all those elements identified as having significant risk have been addressed and suitable solutions developed.
Full automation of all relevant scanning electron microscope (SEM) functions to match fabline requirements have been demonstrated. This included a laser based closed loop control system to control the height of the wafer relative to the objective lens. This eliminates the need manual focussing, and allows constant excitation of the objective lens for maximum reproducibility. New algorithms have been demonstrated that extend the Monte Carlo modelling of electron/matter interaction into the low voltage region with sufficient accuracy to predict physical profiles based on backscattered and secondary electron yield. Metrology software with subpixel interpolation for high precision measurements with maximum ease of use has been developed. Revolutionary detector designs to maximize the yield of those electrons carrying the most information have been demonstrated. A low voltage retarding field emission gun electron column that shows performance well in advance of any known commercial system has been developed.
These achievements will be consolidated into a metrology system that will satisfy the needs of the industry for sub-half micron metrology. However, a number of the project deliverables will be commercialized from their current form.

Topic(s)

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Call for proposal

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Funding Scheme

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Coordinator

NEDERLANDSE PHILIPS BEDRIJVEN BV
EU contribution
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Address
KASTANJELAAN, 1218
5600 MD EINDHOVEN
Netherlands

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Participants (7)