Atomic layer deposition of two-dimensional transition metal dichalcogenide nanolayers

Publicaciones

Atomic Layer Deposition of Al-Doped MoS 2 : Synthesizing a p-type 2D Semiconductor with Tunable Carrier Density

Autores: Vincent Vandalon, Marcel A. Verheijen, Wilhelmus M. M. Kessels, Ageeth A. Bol
Publicado en: ACS Applied Nano Materials, Edición 3/10, 2020, Página(s) 10200-10208, ISSN 2574-0970
Editor: ACS
DOI: 10.1021/acsanm.0c02167

Cu Electrodeposition on Nanostructured MoS 2 and WS 2 and Implications for HER Active Site Determination

Autores: Longfei Wu, Nelson Y. Dzade, Ning Chen, Bas van Dijk, Shashank Balasubramanyam, Akhil Sharma, Lu Gao, Dennis G. H. Hetterscheid, Emiel J. M. Hensen, Ageeth A. Bol, Nora H. De Leeuw, Jan P. Hofmann
Publicado en: Journal of The Electrochemical Society, Edición 167/11, 2020, Página(s) 116517, ISSN 1945-7111
Editor: ECS
DOI: 10.1149/1945-7111/aba5d8

Conformal Growth of Nanometer-Thick Transition Metal Dichalcogenide TiS x -NbS x Heterostructures over 3D Substrates by Atomic Layer Deposition: Implications for Device Fabrication

Autores: Saravana Balaji Basuvalingam, Matthew A. Bloodgood, Marcel A. Verheijen, Wilhelmus M. M. Kessels, Ageeth A. Bol
Publicado en: ACS Applied Nano Materials, Edición 4/1, 2021, Página(s) 514-521, ISSN 2574-0970
Editor: ACS
DOI: 10.1021/acsanm.0c02820

Synthesis of edge-enriched WS 2 on high surface area WS 2 framework by atomic layer deposition for electrocatalytic hydrogen evolution reaction

Autores: Shashank Balasubramanyam, Matthew A. Bloodgood, Yue Zhang, Marcel A. Verheijen, Wilhelmus M. M. Kessels, Jan P. Hofmann, Ageeth A. Bol
Publicado en: Journal of Vacuum Science & Technology A, Edición 38/6, 2020, Página(s) 062201, ISSN 0734-2101
Editor: American Institute of Physics
DOI: 10.1116/6.0000563

Plasma-enhanced atomic layer deposition of tungsten oxide thin films using ( t BuN) 2 (Me 2 N) 2 W and O 2 plasma

Autores: Shashank Balasubramanyam, Akhil Sharma, Vincent Vandalon, Harm C. M. Knoops, Wilhelmus M. M. (Erwin) Kessels, Ageeth A. Bol
Publicado en: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Edición 36/1, 2018, Página(s) 01B103, ISSN 0734-2101
Editor: American Institute of Physics
DOI: 10.1116/1.4986202

Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS 2 : large area, thickness control and tuneable morphology

Autores: Akhil Sharma, Marcel A. Verheijen, Longfei Wu, Saurabh Karwal, Vincent Vandalon, Harm C. M. Knoops, Ravi S. Sundaram, Jan P. Hofmann, W. M. M. (Erwin) Kessels, Ageeth A. Bol
Publicado en: Nanoscale, Edición 10/18, 2018, Página(s) 8615-8627, ISSN 2040-3364
Editor: Royal Society of Chemistry
DOI: 10.1039/c8nr02339e

Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films

Autores: Saravana Balaji Basuvalingam, Bart Macco, Harm C. M. Knoops, Jimmy Melskens, Wilhelmus M. M. (Erwin) Kessels, Ageeth A. Bol
Publicado en: Journal of Vacuum Science & Technology A, Edición 36/4, 2018, Página(s) 041503, ISSN 0734-2101
Editor: American Institute of Physics
DOI: 10.1116/1.5034097

Initial stage of atomic layer deposition of 2D-MoS 2 on a SiO 2 surface: a DFT study

Autores: M. Shirazi, W. M. M. Kessels, A. A. Bol
Publicado en: Physical Chemistry Chemical Physics, Edición 20/24, 2018, Página(s) 16861-16875, ISSN 1463-9076
Editor: Royal Society of Chemistry
DOI: 10.1039/c8cp00210j

Anisotropic infrared light emission from quasi-1D layered TiS 3

Autores: Ali Khatibi, Rasmus H Godiksen, Saravana Balaji Basuvalingam, Daniele Pellegrino, Ageeth A Bol, Babak Shokri, Alberto G Curto
Publicado en: 2D Materials, Edición 7/1, 2020, Página(s) 015022, ISSN 2053-1583
Editor: IOP
DOI: 10.1088/2053-1583/ab57ef

Large area, patterned growth of 2D MoS 2 and lateral MoS 2 –WS 2 heterostructures for nano- and opto-electronic applications

Autores: Akhil Sharma, Reyhaneh Mahlouji, Longfei Wu, Marcel A Verheijen, Vincent Vandalon, Shashank Balasubramanyam, Jan P Hofmann, W M M (Erwin) Kessels, Ageeth A Bol
Publicado en: Nanotechnology, Edición 31/25, 2020, Página(s) 255603, ISSN 0957-4484
Editor: Institute of Physics Publishing
DOI: 10.1088/1361-6528/ab7593

Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS 2 Layers

Autores: Shashank Balasubramanyam, Matthew A. Bloodgood, Mark van Ommeren, Tahsin Faraz, Vincent Vandalon, Wilhelmus M. M. Kessels, Marcel A. Verheijen, Ageeth A. Bol
Publicado en: ACS Applied Materials & Interfaces, Edición 12/3, 2019, Página(s) 3873-3885, ISSN 1944-8244
Editor: American Chemical Society
DOI: 10.1021/acsami.9b19716

Edge-Site Nanoengineering of WS 2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution

Autores: Shashank Balasubramanyam, Mahdi Shirazi, Matthew A. Bloodgood, Longfei Wu, Marcel A. Verheijen, Vincent Vandalon, Wilhelmus M. M. Kessels, Jan P. Hofmann, Ageeth A. Bol
Publicado en: Chemistry of Materials, Edición 31/14, 2019, Página(s) 5104-5115, ISSN 0897-4756
Editor: American Chemical Society
DOI: 10.1021/acs.chemmater.9b01008

Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition

Autores: Saravana Balaji Basuvalingam, Yue Zhang, Matthew A. Bloodgood, Rasmus H. Godiksen, Alberto G. Curto, Jan P. Hofmann, Marcel A. Verheijen, Wilhelmus M. M. Kessels, Ageeth A. Bol
Publicado en: Chemistry of Materials, Edición 31/22, 2019, Página(s) 9354-9362, ISSN 0897-4756
Editor: American Chemical Society
DOI: 10.1021/acs.chemmater.9b02895

Polarized Raman spectroscopy to elucidate the texture of synthesized MoS 2

Autores: Vincent Vandalon, Akhil Sharma, Alberto Perrotta, Benedikt Schrode, Marcel A. Verheijen, Ageeth A. Bol
Publicado en: Nanoscale, Edición 11/47, 2019, Página(s) 22860-22870, ISSN 2040-3364
Editor: Royal Society of Chemistry
DOI: 10.1039/c9nr08750h

The Origin of High Activity of Amorphous MoS 2 in the Hydrogen Evolution Reaction

Autores: Longfei Wu, Alessandro Longo, Nelson Y. Dzade, Akhil Sharma, Marco M. R. M. Hendrix, Ageeth A. Bol, Nora H. Leeuw, Emiel J. M. Hensen, Jan P. Hofmann
Publicado en: ChemSusChem, Edición 12/19, 2019, Página(s) 4383-4389, ISSN 1864-5631
Editor: Wiley - V C H Verlag GmbbH & Co.
DOI: 10.1002/cssc.201901811

Strategies to facilitate the formation of free standing MoS 2 nanolayers on SiO 2 surface by atomic layer deposition: A DFT study

Autores: M. Shirazi, W. M. M. Kessels, A. A. Bol
Publicado en: APL Materials, Edición 6/11, 2018, Página(s) 111107, ISSN 2166-532X
Editor: AIP
DOI: 10.1063/1.5056213

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