Metal Assisted chemical etching of Gratings for X-ray InterferometriC systems

Project Information

MAGIC

Grant agreement ID: 727246

DOI

10.3030/727246

Project closed

EC signature date 26 September 2016

Start date 1 November 2016

End date 30 April 2018

Funded under

• EXCELLENT SCIENCE - European Research Council (ERC)

Total cost

€ 149 997,00

EU contribution

€ 149 997,00

Coordinated by

EIDGENOESSISCHE TECHNISCHE HOCHSCHULE ZUERICH
Switzerland

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Links to deliverables and publications from FP7 projects, as well as links to some specific result types such as dataset and software, are dynamically retrieved from OpenAIRE .

Publications

Peer reviewed articles (4)

Effect of isopropanol on gold assisted chemical etching of silicon microstructures

Author(s): L. Romano, J. Vila-Comamala, K. Jefimovs, M. Stampanoni
Published in: Microelectronic Engineering, Issue 177, 2017, Page(s) 59-65, ISSN 0167-9317
Publisher: Elsevier BV
DOI: 10.1016/j.mee.2017.02.008

High aspect ratio metal microcasting by hot embossing for X-ray optics fabrication

Author(s): L. Romano, J. Vila-Comamala, M. Kagias, K. Vogelsang, H. Schift, M. Stampanoni, K. Jefimovs
Published in: Microelectronic Engineering, Issue 176, 2017, Page(s) 6-10, ISSN 0167-9317
Publisher: Elsevier BV
DOI: 10.1016/j.mee.2016.12.032

Hot embossing of Au- and Pb-based alloys for x-ray grating fabrication

Author(s): Lucia Romano, Joan Vila-Comamala, Helmut Schift, Marco Stampanoni, Konstantins Jefimovs
Published in: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Issue 35/6, 2017, Page(s) 06G302, ISSN 2166-2754
Publisher: AVS Science and Technology Society
DOI: 10.1116/1.4991807

Towards sub-micrometer high aspect ratio X-ray gratings by atomic layer deposition of iridium

Author(s): Joan Vila-Comamala, Lucia Romano, Vitaliy Guzenko, Matias Kagias, Marco Stampanoni, Konstantins Jefimovs
Published in: Microelectronic Engineering, Issue 192, 2018, Page(s) 19-24, ISSN 0167-9317
Publisher: Elsevier BV
DOI: 10.1016/j.mee.2018.01.027

Conference proceedings (1)

High-aspect ratio silicon structures by displacement Talbot lithography and Bosch etching

Author(s): Konstantins Jefimovs, Lucia Romano, Joan Vila-Comamala, Matias Kagias, Zhentian Wang, Li Wang, Christian Dais, Harun Solak, Marco Stampanoni
Published in: Advances in Patterning Materials and Processes XXXIV, 2017, Page(s) 101460L
Publisher: SPIE
DOI: 10.1117/12.2258007