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Nanoscale self-assembled epitaxial nucleation controlled by interference lithography

Periodic Reporting for period 2 - NanoStencil (Nanoscale self-assembled epitaxial nucleation controlled by interference lithography)

Periodo di rendicontazione: 2018-10-01 al 2021-07-31

Surface thermal transient following laser interference lithography
Optical arrangement for 4 beam MBE lithography
Image of the CEIT CVD reactor
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