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Plasmon Enhanced Photocatalytic Nano Lithography

Project description

New nanolithography technique promises to draw nanoscale features with higher resolution

Success in the nanotechnology field depends on the capability to engineer a variety of structures on the nanometre scale that can be used across other science fields. However, many scientific breakthroughs remain in the laboratory. This is largely due to technological limitations in the ability to manufacture complex and accurate nanometre-resolved surface patterns with satisfying resolution and on a large area. The EU-funded NanoGraphy project will demonstrate a novel nano fabrication technique that will leverage highly controlled multi-electron photocatalytic reactions led by a plasmonic field. Project developments will have important implications for high-resolution nanolithography, bringing nanotechnology breakthroughs out of the laboratory and into society.

Objective

The emergence of nanoscience and nanotechnology, with envisioned applications spanning from nano-optics and nano-photonics, to plasmonics and nano-electronics, depends on the capability to fabricate a variety of nanometre-scale structures. Despite the impressive development in these fields, breakthroughs remain in the laboratory, largely due to technological limitations in the ability to manufacture complex and accurate nanometer-resolved surface patterns, with satisfying resolution and on large area. The development of a new fabrication methodology is thus required. We propose to develop and demonstrate a novel technique for nanoscale photolithography that would bring 21st century nanotechnology breakthroughs out of the lab and into the public sphere. This technique is based on a chemical mechanism recently discovered in my lab. We revealed that multi-electron photocatalytic reactions could be directed to progress exclusively under a plasmonic field, in a controlled and highly localized manner. In this proposal we describe how this phenomenon may be leveraged for pattering, and high-resolution nano lithography. The project is divided into 3 stages: 1. Fundamentals of the underlying physical phenomena 2. Probe enhanced photocatalytic writing 3. Photolithography via plasmon enhanced photocatalytic mask At the end of the 5-year project we expect to be at a position to demonstrate our platform for lithographic writing of an interesting nano pattern of high quality, and establish the potential of this methodology as a powerful instrument in the nanotechnology researcher’s toolbox. I strongly believe that successful implementation of this project would fundamentally change the way in which nanotechnology affects modern life.

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Coordinator

TECHNION - ISRAEL INSTITUTE OF TECHNOLOGY
Net EU contribution
€ 1 500 000,00
Address
Senate building technion city
32000 Haifa
Israel

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Activity type
Higher or Secondary Education Establishments
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Other funding
€ 0,00

Beneficiaries (1)