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Plasmon Enhanced Photocatalytic Nano Lithography

Descripción del proyecto

Una nueva técnica nanolitográfica promete diseñar características a nanoescala con mayor resolución

En el campo de la nanotecnología, el éxito depende de la capacidad de diseñar una variedad de estructuras a escala nanométrica que se puedan utilizar en otros ámbitos científicos. Sin embargo, muchos avances científicos se quedan en el laboratorio. Esto se debe, en gran medida, a las limitaciones tecnológicas que plantea la fabricación de patrones de superficies complejas y precisas a escala nanométrica con una resolución satisfactoria y en un área grande. El proyecto NanoGraphy, financiado con fondos europeos, demostrará una novedosa técnica de nanofabricación que aprovechará las reacciones fotocatalíticas de varios electrones extremadamente controladas guiadas por un campo plasmónico. Los avances del proyecto influirán sobremanera en la nanolitografía de alta resolución, lo que conseguirá llevar las innovaciones en nanotecnología del laboratorio a la sociedad.

Objetivo

The emergence of nanoscience and nanotechnology, with envisioned applications spanning from nano-optics and nano-photonics, to plasmonics and nano-electronics, depends on the capability to fabricate a variety of nanometre-scale structures. Despite the impressive development in these fields, breakthroughs remain in the laboratory, largely due to technological limitations in the ability to manufacture complex and accurate nanometer-resolved surface patterns, with satisfying resolution and on large area. The development of a new fabrication methodology is thus required. We propose to develop and demonstrate a novel technique for nanoscale photolithography that would bring 21st century nanotechnology breakthroughs out of the lab and into the public sphere. This technique is based on a chemical mechanism recently discovered in my lab. We revealed that multi-electron photocatalytic reactions could be directed to progress exclusively under a plasmonic field, in a controlled and highly localized manner. In this proposal we describe how this phenomenon may be leveraged for pattering, and high-resolution nano lithography. The project is divided into 3 stages: 1. Fundamentals of the underlying physical phenomena 2. Probe enhanced photocatalytic writing 3. Photolithography via plasmon enhanced photocatalytic mask At the end of the 5-year project we expect to be at a position to demonstrate our platform for lithographic writing of an interesting nano pattern of high quality, and establish the potential of this methodology as a powerful instrument in the nanotechnology researcher’s toolbox. I strongly believe that successful implementation of this project would fundamentally change the way in which nanotechnology affects modern life.

Régimen de financiación

ERC-STG - Starting Grant

Institución de acogida

TECHNION - ISRAEL INSTITUTE OF TECHNOLOGY
Aportación neta de la UEn
€ 1 500 000,00
Dirección
SENATE BUILDING TECHNION CITY
32000 Haifa
Israel

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Tipo de actividad
Higher or Secondary Education Establishments
Enlaces
Coste total
€ 1 500 000,00

Beneficiarios (1)