From the bottom-up: a physico-chemical approach towards 3D nanostructures with atomic-scale control

Project Information

BottomUp3D

Grant agreement ID: 949202

DOI 10.3030/949202

EC signature date 10 August 2020

Start date 1 January 2021

End date 31 December 2025

Funded under

• EXCELLENT SCIENCE - European Research Council (ERC)

Total cost € 1 895 897,00

EU contribution € 1 895 897,00

Coordinated by

TECHNISCHE UNIVERSITEIT EINDHOVEN
Netherlands

Publications

Peer reviewed articles (3)

Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors

Author(s): Marc J. M. Merkx; Athanasios Angelidis; Alfredo Mameli; Jun Li; Paul C. Lemaire; Kashish Sharma; Dennis M. Hausmann; Wilhelmus M. M. Kessels; Tania E. Sandoval; Adriaan J. M. Mackus
Published in: Journal of Physical Chemistry C, 126(10), 4845 - 4853. American Chemical Society, Issue 1, 2022, ISSN 1932-7447
Publisher: American Chemical Society
DOI: 10.1021/acs.jpcc.1c10816

Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations

Author(s): J. Li, I. Tezsevin, M.J.M. Merkx, J.F.W. Maas, W.M.M. Kessels, T.E. Sandoval, A.J.M. Mackus
Published in: Journal of Vacuum Science & Technology A, Issue 40, 2022, Page(s) 062409, ISSN 1520-8559
Publisher: American Institute of Physics
DOI: 10.1116/6.0002096

Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor

Author(s): I. Tezsevin; J. F. W. Maas; M. J. M. Merkx; R. Lengers; W. M. M. Kessels; T. E. Sandoval; A. J. M. Mackus
Published in: Langmuir, Issue 39, 2023, Page(s) 4265-4273, ISSN 1520-5827
Publisher: American Chemical Society
DOI: 10.1021/acs.langmuir.2c03214