From the bottom-up: a physico-chemical approach towards 3D nanostructures with atomic-scale control

Project Information

BottomUp3D

Grant agreement ID: 949202

DOI

10.3030/949202

EC signature date 10 August 2020

Start date 1 January 2021

End date 31 December 2025

Funded under

• EXCELLENT SCIENCE - European Research Council (ERC)

Total cost

€ 1 895 897,00

EU contribution

€ 1 895 897,00

Coordinated by

TECHNISCHE UNIVERSITEIT EINDHOVEN
Netherlands

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Publications

Peer reviewed articles (6)

Area-Selective Atomic Layer Deposition through Selective Passivation of SiO₂ with a SF₆/H₂ Plasma

Author(s): Olaf C. A. Bolkenbaas, Marc J. M. Merkx, Nicholas J. Chittock, Ilker Tezsevin, Wilhelmus M. M. Kessels, Tania E. Sandoval, Adriaan J. M. Mackus
Published in: Chemistry of Materials, Issue 37, 2025, Page(s) 4982-4991, ISSN 0897-4756
Publisher: American Chemical Society
DOI: 10.1021/acs.chemmater.4c03316

The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes

Author(s): I. Tezsevin, J. H. Deijkers, M. J. M. Merkx, W. M. M. Kessels, T. E. Sandoval, A. J. M. Mackus
Published in: The Journal of Physical Chemistry Letters, Issue 15, 2024, Page(s) 7496-7501, ISSN 1948-7185
Publisher: American Chemical Society
DOI: 10.1021/acs.jpclett.4c01632

Investigation of the atomic layer etching mechanism for Al₂O₃ using hexafluoroacetylacetone and H₂ plasma

Author(s): Nicholas J. Chittock, Joost F. W. Maas, Ilker Tezsevin, Marc J. M. Merkx, Harm C. M. Knoops, Wilhelmus M. M. (Erwin) Kessels, Adriaan J. M. Mackus
Published in: Journal of Materials Chemistry C, Issue 13, 2025, Page(s) 1345-1358, ISSN 2050-7534
Publisher: Royal Society of Chemistry
DOI: 10.1039/d4tc03615h

Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors

Author(s): Marc J. M. Merkx; Athanasios Angelidis; Alfredo Mameli; Jun Li; Paul C. Lemaire; Kashish Sharma; Dennis M. Hausmann; Wilhelmus M. M. Kessels; Tania E. Sandoval; Adriaan J. M. Mackus
Published in: Journal of Physical Chemistry C, 126(10), 4845 - 4853. American Chemical Society, Issue 1, 2022, ISSN 1932-7447
Publisher: American Chemical Society
DOI: 10.1021/acs.jpcc.1c10816

Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations

Author(s): J. Li, I. Tezsevin, M.J.M. Merkx, J.F.W. Maas, W.M.M. Kessels, T.E. Sandoval, A.J.M. Mackus
Published in: Journal of Vacuum Science & Technology A, Issue 40, 2022, Page(s) 062409, ISSN 1520-8559
Publisher: American Institute of Physics
DOI: 10.1116/6.0002096

Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor

Author(s): I. Tezsevin; J. F. W. Maas; M. J. M. Merkx; R. Lengers; W. M. M. Kessels; T. E. Sandoval; A. J. M. Mackus
Published in: Langmuir, Issue 39, 2023, Page(s) 4265-4273, ISSN 1520-5827
Publisher: American Chemical Society
DOI: 10.1021/acs.langmuir.2c03214