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Electrodeposition of compositionally modulated multilayers for integrated magnetoresistance magnetic field microsensor arrays

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Research objectives and content
In order to increase the magnetoresistive (MR) characteristics in planar multilayer structures, current-at-an-angle-to-plane (C. iP) geometry's have been proposed. One of the main objectives of this proposed research is to combine the growth techniqu of electrodeposition with various lithographic methods in order to fabricate novel CAP structures which will take the forrr of multilayered hemispheres connected together at their bases. The advantages of using both electrodeposition and a nat ral lithography technique being low capital investment, simplicity, low deposition temperatures and increased flexibility. 'he growth and lithographic techniques will be optimised in order to give uniform growth across the substrate, uniform I beer thicknesses and an optimised magnetoresistance response. Investigations on patterning the substrates so that contacts can be . made to the structures for magnetoresistance measurements will be carried out. l The ultimate aim of the project will be, using the skills and techniques learnt, to design and fabricate a demonstrator microse sor l array device.
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Training content (objective, benefit and expected impact)
The interdisciplinary and complimentary training aspects that both MTM and IMEC have to offer will lead to a broaden ng l experience which will allow me to make a significant contribution to the growing field of integrated magnetoresistive magn . field sensor technology
Links with industry / industrial relevance (22)
There is great interest from industry in the incorporation of magnetic materials in the fabrication of multichannel microsens using the well established semiconductor technology. Many groups in Europe (for example, Thomson and Philips) are work towards the goal of using this technology for the development of the next generation of MR magnetic field sensors

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Aufforderung zur Vorschlagseinreichung

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Finanzierungsplan

RGI - Research grants (individual fellowships)

Koordinator

KATHOLIEKE UNIVERSITEIT LEUVEN
EU-Beitrag
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Adresse
2,Kasteelpartk Arenberg, 44
3001 HEVERLEE
Belgien
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Beteiligte (1)