Ziel
The overall goal of OPTIMA is to demonstrate the effectiveness of proximity corrections in a production environment for both memory and logic applications.
To develop a commercially available software tool which generates fully automatically a proximity corrected IC design with maximum CD variation due to proximity effects not more than 5% of the target dimension.
To produce test masks for proximity parametrisation, demonstration masks for logic and memory applications (total dimension control better than 70 nm), and masks to investigate the resolution limits when applying OPC in combination with other enhancement techniques (total dimension control better than 50 nm).
To assess the economical impact of the introduction of OPC taking into account that prices of proximity corrected reticles will be close to those of embedded PSM.
Optical lithography is a key technique used in semiconductor manufacturing. Strong efforts are being made worldwide to drive it to its technical limits in order to postpone the inevitable introduction of non-optical techniques. Optical Proximity Correction (OPC) is a novel technique which will make it possible to extend the practical resolution limits of existing exposure tools by at least one technology generation. The necessary OPC tools will be developed and evaluated under OPTIMA.
Wissenschaftliches Gebiet
Programm/Programme
Aufforderung zur Vorschlagseinreichung
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EXC - Marie Curie actions-ChairsKoordinator
5656 AA Eindhoven
Niederlande